Invention Grant
- Patent Title: Method for fabrication of configurable systems
- Patent Title (中): 可配置系统的制造方法
-
Application No.: US13471009Application Date: 2012-05-14
-
Publication No.: US08664042B2Publication Date: 2014-03-04
- Inventor: Zvi Or-Bach , Deepak C. Sekar , Brian Cronquist , Israel Beinglass , Jan Lodewijk de Jong
- Applicant: Zvi Or-Bach , Deepak C. Sekar , Brian Cronquist , Israel Beinglass , Jan Lodewijk de Jong
- Applicant Address: US CA San Jose
- Assignee: Monolithic 3D Inc.
- Current Assignee: Monolithic 3D Inc.
- Current Assignee Address: US CA San Jose
- Agency: Tran & Associates
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A method to construct configurable systems, the method including: providing a first configurable system including a first die and a second die, where the connections between the first die and the second die include through-silicon-via (“TSV”), where the first die is diced from a first wafer using first dice lines; providing a second configurable system including a third die and a fourth die, where the connections between the third die and the fourth die include through-silicon-via (“TSV”), where the third die is diced from a third wafer using third dice lines; and processing the first wafer and the third wafer utilizing at least 20 masks that are the same; where the first dice lines are substantially different than the third dice lines, and where the second die includes a configurable I/O to connect the first configurable system to external devices.
Public/Granted literature
- US20120223738A1 METHOD FOR FABRICATION OF A SEMICONDUCTOR DEVICE AND STRUCTURE Public/Granted day:2012-09-06
Information query
IPC分类: