Invention Grant
- Patent Title: Power MOSFETs and methods for forming the same
- Patent Title (中): 功率MOSFET及其形成方法
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Application No.: US13348463Application Date: 2012-01-11
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Publication No.: US08664718B2Publication Date: 2014-03-04
- Inventor: Chih-Chang Cheng , Fu-Yu Chu , Ruey-Hsin Liu , Hsiao-Chin Tuan
- Applicant: Chih-Chang Cheng , Fu-Yu Chu , Ruey-Hsin Liu , Hsiao-Chin Tuan
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Slater & Matsil, L.L.P.
- Main IPC: H01L29/66
- IPC: H01L29/66

Abstract:
A power MOSFET includes a semiconductor region extending from a top surface of a semiconductor substrate into the semiconductor substrate, wherein the semiconductor region is of a first conductivity type. A gate dielectric and a gate electrode are disposed over the semiconductor region. A drift region of a second conductivity type opposite the first conductivity type extends from the top surface of the semiconductor substrate into the semiconductor substrate. A dielectric layer has a portion over and in contact with a top surface of the drift region. A conductive field plate is over the dielectric layer. A source region and a drain region are on opposite sides of the gate electrode. The drain region is in contact with the first drift region. A bottom metal layer is over the field plate.
Public/Granted literature
- US20130134512A1 Power MOSFETs and Methods for Forming the Same Public/Granted day:2013-05-30
Information query
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