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US08675188B2 Method and system for determining one or more optical characteristics of structure of a semiconductor wafer 有权
用于确定半导体晶片的结构的一个或多个光学特性的方法和系统

Method and system for determining one or more optical characteristics of structure of a semiconductor wafer
Abstract:
Determination of one or more optical characteristics of a structure of a semiconductor wafer includes measuring one or more optical signals from one or more structures of a sample, determining a background optical field associated with a reference structure having a selected set of nominal characteristics based on the one or more structures, determining a correction optical field suitable for at least partially correcting the background field, wherein a difference between the measured one or more optical signals and a signal associated with a sum of the correction optical field and the background optical field is below a selected tolerance level, and extracting one or more characteristics associated with the one or more structures utilizing the correction optical field.
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