Invention Grant
- Patent Title: Charged particle lithography apparatus and method of generating vacuum in a vacuum chamber
- Patent Title (中): 带电粒子光刻设备和在真空室中产生真空的方法
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Application No.: US12708545Application Date: 2010-02-19
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Publication No.: US08690005B2Publication Date: 2014-04-08
- Inventor: Sander Baltussen , Guido De Boer , Tijs Frans Teepen , Hugo Martijn Makkink
- Applicant: Sander Baltussen , Guido De Boer , Tijs Frans Teepen , Hugo Martijn Makkink
- Applicant Address: NL Delft
- Assignee: Mapper Lithography IP B.V.
- Current Assignee: Mapper Lithography IP B.V.
- Current Assignee Address: NL Delft
- Agency: Hoyng Monegier LLP
- Agent David P. Owen; Coraline J. Haitjema
- Main IPC: B65D6/00
- IPC: B65D6/00 ; B65D8/04
Abstract:
A vacuum chamber comprising a plurality of wall panels enclosing an interior space, in which the wall panels are removably attached to form the chamber using a plurality of connection members for locating the wall panels in a predetermined arrangement. The vacuum chamber further comprises one or more sealing members provided at the edges of the wall panels. The wall panels are arranged so that a vacuum tight seal is formed at the edges of the wall panels as a result of forming a vacuum in the interior space.
Public/Granted literature
- US20100270299A1 CHARGED PARTICLE LITHOGRAPHY APPARATUS AND METHOD OF GENERATING VACUUM IN A VACUUM CHAMBER Public/Granted day:2010-10-28
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