公开(公告)号：US20100270299A1

公开(公告)日：2010-10-28

申请号：US12708545

申请日：2010-02-19

Applicant: Sander BALTUSSEN ,  Guido DE BOER ,  Tijs Frans TEEPEN ,  Hugo Martijn MAKKINK

Inventor： Sander BALTUSSEN ,  Guido DE BOER ,  Tijs Frans TEEPEN ,  Hugo Martijn MAKKINK

IPC: B65D6/24 ,  B65D90/08

CPC classification number: H01J37/16 ,  H01J37/18 ,  H01J2237/166 ,  H01L21/67161 ,  H01L21/6719

Abstract: A vacuum chamber comprising a plurality of wall panels enclosing an interior space, in which the wall panels are removably attached to form the chamber using a plurality of connection members for locating the wall panels in a predetermined arrangement. The vacuum chamber further comprises one or more sealing members provided at the edges of the wall panels. The wall panels are arranged so that a vacuum tight seal is formed at the edges of the wall panels as a result of forming a vacuum in the interior space.

Abstract translation: 一种真空室，包括多个围绕内部空间的壁板，其中壁板可移除地连接以形成室，其中多个连接构件用于以预定布置定位壁板。 真空室还包括设置在墙板边缘处的一个或多个密封构件。 壁板被布置成使得由于在内部空间中形成真空而在壁板的边缘处形成真空密封。

公开(公告)号：US20110042579A1

公开(公告)日：2011-02-24

申请号：US12708544

申请日：2010-02-19

Applicant: Guido DE BOER ,  Sander BALTUSSEN ,  Remco JAGER ,  Jerry Johannes Martinus PEIJSTER ,  Tijs Frans TEEPEN ,  Joris Anne Henri VAN NIEUWSTADT ,  Willem Maurits WEEDA ,  Alexander Hendrik Vincent VAN VEEN

Inventor： Guido DE BOER ,  Sander BALTUSSEN ,  Remco JAGER ,  Jerry Johannes Martinus PEIJSTER ,  Tijs Frans TEEPEN ,  Joris Anne Henri VAN NIEUWSTADT ,  Willem Maurits WEEDA ,  Alexander Hendrik Vincent VAN VEEN

IPC: H01J37/20

CPC classification number: H01J37/16 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/165 ,  H01J37/18 ,  H01J37/20 ,  H01J37/305 ,  H01J37/317 ,  H01J37/3174 ,  H01J2237/16

Abstract: The invention relates to a charged particle lithography apparatus with a charged particle source for creating one or more charged particle beams, a charged particle projector for projecting the beams onto a wafer; and a moveable wafer stage for carrying the wafer. The charged particle source, charged particle projector, and moveable wafer stage are disposed in a common vacuum chamber forming a vacuum environment. The vacuum chamber further has an opening for loading wafers into the chamber and a door.

Abstract translation: 本发明涉及具有用于产生一个或多个带电粒子束的带电粒子源的带电粒子光刻设备，用于将光束投射到晶片上的带电粒子投影仪; 以及用于承载晶片的可移动晶片台。 带电粒子源，带电粒子投影仪和可移动晶片台设置在形成真空环境的公共真空室中。 真空室还具有用于将晶片装载到室中的开口和门。

公开(公告)号：US07868300B2

公开(公告)日：2011-01-11

申请号：US11521705

申请日：2006-09-14

Applicant: Pieter Kruit ,  Erwin Slot ,  Tijs Frans Teepen ,  Marco Jan Jaco Wieland ,  Stijn Willem Karel Herman Steenbrink

Inventor： Pieter Kruit ,  Erwin Slot ,  Tijs Frans Teepen ,  Marco Jan Jaco Wieland ,  Stijn Willem Karel Herman Steenbrink

IPC: H01J3/00

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3045 ,  H01J2237/2443 ,  H01J2237/2446 ,  H01J2237/30433 ,  H01J2237/31757

Abstract: Lithography system, sensor and method for measuring properties of a massive amount of charged particle beams of a charged particle beam system, in particular a direct write lithography system, in which the charged particle beams are converted into light beams by using a converter element, using an array of light sensitive detectors such as diodes, CCD or CMOS devices, located in line with said converter element, for detecting said light beams, electronically reading out resulting signals from said detectors after exposure thereof by said light beams, utilizing said signals for determining values for one or more beam properties, thereby using an automated electronic calculator, and electronically adapting the charged particle system so as to correct for out of specification range values for all or a number of said charged particle beams, each for one or more properties, based on said calculated property values.

Abstract translation: 用于测量带电粒子束系统的大量带电粒子束的特性的光刻系统，传感器和方法，特别是直接写入光刻系统，其中通过使用转换器元件将带电粒子束转换成光束，使用 与所述转换器元件成一直线的一系列光敏检测器，例如二极管，CCD或CMOS器件，用于检测所述光束，用所述光束曝光之后，从所述检测器电子地读出所得到的信号，利用所述信号确定 一个或多个光束特性的值，从而使用自动电子计算器，以及电子地调整带电粒子系统，以便校正超出所有或多个所述带电粒子束的规格范围值，每一个用于一个或多个属性， 基于所述计算的属性值。

公开(公告)号：US08690005B2

公开(公告)日：2014-04-08

申请号：US12708545

申请日：2010-02-19

Applicant: Sander Baltussen ,  Guido De Boer ,  Tijs Frans Teepen ,  Hugo Martijn Makkink

Inventor： Sander Baltussen ,  Guido De Boer ,  Tijs Frans Teepen ,  Hugo Martijn Makkink

IPC: B65D6/00 ,  B65D8/04

CPC classification number: H01J37/16 ,  H01J37/18 ,  H01J2237/166 ,  H01L21/67161 ,  H01L21/6719

Abstract: A vacuum chamber comprising a plurality of wall panels enclosing an interior space, in which the wall panels are removably attached to form the chamber using a plurality of connection members for locating the wall panels in a predetermined arrangement. The vacuum chamber further comprises one or more sealing members provided at the edges of the wall panels. The wall panels are arranged so that a vacuum tight seal is formed at the edges of the wall panels as a result of forming a vacuum in the interior space.

Abstract translation: 一种真空室，包括多个围绕内部空间的壁板，其中壁板可移除地连接以形成室，其中多个连接构件用于以预定布置定位壁板。 真空室还包括设置在墙板边缘处的一个或多个密封构件。 壁板被布置成使得由于在内部空间中形成真空而在壁板的边缘处形成真空密封。