Invention Grant
- Patent Title: Method and apparatus for depositing a pattern on a substrate
- Patent Title (中): 用于在基板上沉积图案的方法和装置
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Application No.: US11321780Application Date: 2005-12-29
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Publication No.: US08691667B1Publication Date: 2014-04-08
- Inventor: Charles Douglas MacPherson , Dennis Damon Walker , Matthew Stainer
- Applicant: Charles Douglas MacPherson , Dennis Damon Walker , Matthew Stainer
- Applicant Address: US DE Wilmington
- Assignee: E. I. du Pont de Nemours and Company
- Current Assignee: E. I. du Pont de Nemours and Company
- Current Assignee Address: US DE Wilmington
- Main IPC: H01L21/326
- IPC: H01L21/326
Abstract:
This invention relates to a process for forming a continuous pattern on a substrate with a liquid media. Upon the deposition of the liquid media on the substrate, a portion the continuous pattern is evaporated upon contact with the substrate.
Information query
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