发明授权
US08695110B2 Scanning probe microscope and sample observing method using the same
有权
扫描探针显微镜及使用其的样品观察方法
- 专利标题: Scanning probe microscope and sample observing method using the same
- 专利标题(中): 扫描探针显微镜及使用其的样品观察方法
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申请号: US13586754申请日: 2012-08-15
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公开(公告)号: US08695110B2公开(公告)日: 2014-04-08
- 发明人: Toshihiko Nakata , Masahiro Watanabe , Takashi Inoue , Kishio Hidaka , Motoyuki Hirooka
- 申请人: Toshihiko Nakata , Masahiro Watanabe , Takashi Inoue , Kishio Hidaka , Motoyuki Hirooka
- 申请人地址: JP Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Antonelli, Terry, Stout & Kraus, LLP.
- 优先权: JP2007-061201 20070312; JP2007-322722 20071214
- 主分类号: G01Q70/00
- IPC分类号: G01Q70/00 ; G01Q70/16 ; G01N13/00
摘要:
In a near-field scanning microscope using an aperture probe, the upper limit of the aperture formation is at most several ten nm in practice. In a near-field scanning microscope using a scatter probe, the resolution ability is limited to at most several ten nm because of the external illuminating light serving as background noise. Moreover, measurement reproducibility is seriously lowered by a damage or abrasion of a probe. Optical data and unevenness data of the surface of a sample can be measured at a nm-order resolution ability and a high reproducibility while damaging neither the probe nor the sample by fabricating a plasmon-enhanced near-field probe having a nm-order optical resolution ability by combining a nm-order cylindrical structure with nm-order microparticles and repeatedly moving the probe toward the sample and away therefrom at a low contact force at individual measurement points on the sample.
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