Invention Grant
US08697320B2 Phenol compounds and positive photosensitive resin composition including the same
有权
苯酚化合物和包含其的正型感光性树脂组合物
- Patent Title: Phenol compounds and positive photosensitive resin composition including the same
- Patent Title (中): 苯酚化合物和包含其的正型感光性树脂组合物
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Application No.: US13242120Application Date: 2011-09-23
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Publication No.: US08697320B2Publication Date: 2014-04-15
- Inventor: Ji-Young Jeong , Min-Kook Chung , Hyun-Yong Cho , Yong-Sik Yoo , Jeong-Woo Lee , Jong-Hwa Lee , Hwan-Sung Cheon , Soo-Young Kim , Young-Ho Kim , Jae-Hyun Kim , Su-Min Park
- Applicant: Ji-Young Jeong , Min-Kook Chung , Hyun-Yong Cho , Yong-Sik Yoo , Jeong-Woo Lee , Jong-Hwa Lee , Hwan-Sung Cheon , Soo-Young Kim , Young-Ho Kim , Jae-Hyun Kim , Su-Min Park
- Applicant Address: KR Gumi-si KR Suwon-si
- Assignee: Cheil Industries Inc.,Samsung Electronics Co., Ltd.
- Current Assignee: Cheil Industries Inc.,Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gumi-si KR Suwon-si
- Agency: Additon, Higgins, Pendleton & Ashe, P.A.
- Priority: KR10-2010-0128277 20101215
- Main IPC: G03F7/023
- IPC: G03F7/023 ; G03F7/022
Abstract:
Disclosed are a novel phenol compound comprising a compound represented by Chemical Formula 1, a compound represented by Chemical Formula 2, or a combination thereof, and a positive photosensitive resin composition including the same.
Public/Granted literature
- US20120156614A1 Novel Phenol Compounds and Positive Photosensitive Resin Composition Including the Same Public/Granted day:2012-06-21
Information query
IPC分类:
