发明授权
- 专利标题: Extreme ultraviolet light generation apparatus
- 专利标题(中): 极紫外光发生装置
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申请号: US13396289申请日: 2012-02-14
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公开(公告)号: US08698112B2公开(公告)日: 2014-04-15
- 发明人: Takayuki Yabu , Kouji Kakizaki , Takanobu Ishihara , Tamotsu Abe , Osamu Wakabayashi
- 申请人: Takayuki Yabu , Kouji Kakizaki , Takanobu Ishihara , Tamotsu Abe , Osamu Wakabayashi
- 申请人地址: JP Tochigi
- 专利权人: Gigaphoton Inc.
- 当前专利权人: Gigaphoton Inc.
- 当前专利权人地址: JP Tochigi
- 代理机构: McDermott Will & Emery LLP
- 优先权: JP2011-038576 20110224; JP2011-063137 20110322; JP2011-282189 20111222
- 主分类号: H01J35/20
- IPC分类号: H01J35/20
摘要:
An apparatus, configured to generate extreme ultraviolet light by irradiating a target material by a laser beam from a laser apparatus to turn the target material into plasma, includes a chamber with an inlet for introducing the laser beam into the chamber, the chamber including an electrically conductive structural member; and a target generator including an electrode having a first through-hole through which a charged target passes, an electrical insulator for holding the electrode, and a shielding member having a second through-hole, through which the charged target passes, the shielding member being positioned between a plasma generation region and at least the electrical insulator. The target generator generates the charged target of a liquid target material and output the charged target toward the plasma generation region inside the chamber, and the shielding member has electrically conductive properties and is connected electrically to the electrically conductive structural member of the chamber.
公开/授权文献
- US20120217422A1 EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS 公开/授权日:2012-08-30