-
公开(公告)号：US08698112B2
公开(公告)日：2014-04-15
申请号：US13396289
申请日：2012-02-14
IPC分类号： H01J35/20
CPC分类号： H05G2/006 , G03F7/70033 , H05G2/008
摘要： An apparatus, configured to generate extreme ultraviolet light by irradiating a target material by a laser beam from a laser apparatus to turn the target material into plasma, includes a chamber with an inlet for introducing the laser beam into the chamber, the chamber including an electrically conductive structural member; and a target generator including an electrode having a first through-hole through which a charged target passes, an electrical insulator for holding the electrode, and a shielding member having a second through-hole, through which the charged target passes, the shielding member being positioned between a plasma generation region and at least the electrical insulator. The target generator generates the charged target of a liquid target material and output the charged target toward the plasma generation region inside the chamber, and the shielding member has electrically conductive properties and is connected electrically to the electrically conductive structural member of the chamber.
摘要翻译： 一种被配置为通过用来自激光装置的激光束照射目标材料以将目标材料转换成等离子体而产生极紫外光的装置包括具有用于将激光束引入腔室的入口的腔室，该腔室包括电 导电结构件; 以及目标发生器，其包括具有带电对象通过的第一通孔的电极，用于保持电极的电绝缘体和具有第二通孔的屏蔽部件，被充电对象通过该屏蔽部件，所述屏蔽部件为 位于等离子体产生区域和至少电绝缘体之间。 目标发生器产生液体目标材料的充电目标，并将该充电目标输送到室内的等离子体产生区域，并且该屏蔽部件具有导电性能并且与该腔室的导电结构部件电连接。
-
公开(公告)号：US20120217422A1
公开(公告)日：2012-08-30
申请号：US13396289
申请日：2012-02-14
IPC分类号： G01J3/10
CPC分类号： H05G2/006 , G03F7/70033 , H05G2/008
摘要： An apparatus, configured to generate extreme ultraviolet light by irradiating a target material by a laser beam from a laser apparatus to turn the target material into plasma, includes a chamber with an inlet for introducing the laser beam into the chamber, the chamber including an electrically conductive structural member; and a target generator including an electrode having a first through-hole through which a charged target passes, an electrical insulator for holding the electrode, and a shielding member having a second through-hole, through which the charged target passes, the shielding member being positioned between a plasma generation region and at least the electrical insulator. The target generator generates the charged target of a liquid target material and output the charged target toward the plasma generation region inside the chamber, and the shielding member has electrically conductive properties and is connected electrically to the electrically conductive structural member of the chamber.
摘要翻译： 一种被配置为通过用来自激光装置的激光束照射目标材料以将目标材料转换成等离子体而产生极紫外光的装置包括具有用于将激光束引入腔室的入口的腔室，该腔室包括电 导电结构件; 以及目标发生器，其包括具有带电对象通过的第一通孔的电极，用于保持电极的电绝缘体和具有第二通孔的屏蔽部件，被充电对象通过该屏蔽部件，所述屏蔽部件为 位于等离子体产生区域和至少电绝缘体之间。 目标发生器产生液体目标材料的充电目标，并将该充电目标输送到室内的等离子体产生区域，并且该屏蔽部件具有导电性能并且与该腔室的导电结构部件电连接。
-
公开(公告)号：US08507883B2
公开(公告)日：2013-08-13
申请号：US12559977
申请日：2009-09-15
申请人： Akira Endo , Hideo Hoshino , Kouji Kakizaki , Tamotsu Abe , Akira Sumitani , Takanobu Ishihara , Shinji Nagai , Osamu Wakabayashi , Hakaru Mizoguchi
发明人： Akira Endo , Hideo Hoshino , Kouji Kakizaki , Tamotsu Abe , Akira Sumitani , Takanobu Ishihara , Shinji Nagai , Osamu Wakabayashi , Hakaru Mizoguchi
IPC分类号： G21G4/00
摘要： An extreme ultraviolet light source apparatus provided with a magnetic field forming unit having sufficient capability of protection against ions radiated from plasma while using a relatively small magnetic source. The apparatus includes: a target nozzle for injecting a target material; a driver laser for applying a laser beam to the target material to generate plasma; a collector mirror for collecting extreme ultraviolet light radiated from the plasma; and a magnetic field forming unit including at least one magnetic source and at least one magnetic material having two leading end parts projecting from the at least one magnetic source to face each other with a plasma emission point in between, and forming a magnetic field between a trajectory of the target material and the collector mirror.
摘要翻译： 一种极紫外光源装置，其具有磁场形成单元，该磁场形成单元在使用相对较小的磁源时具有足够的抵抗从等离子体辐射的离子的能力。 该装置包括：用于注射目标材料的目标喷嘴; 用于将激光束施加到目标材料以产生等离子体的驱动激光器; 用于收集从等离子体辐射的极紫外光的收集镜; 以及磁场形成单元，其包括至少一个磁源和至少一个磁性材料，所述至少一个磁性材料具有从所述至少一个磁源突出的两个前端部分，其间具有等离子体发射点，并在其之间形成磁场 目标材料和收集镜的轨迹。
-
公开(公告)号：US20100090132A1
公开(公告)日：2010-04-15
申请号：US12559977
申请日：2009-09-15
申请人： Akira ENDO , Hideo Hoshino , Kouji Kakizaki , Tamotsu Abe , Akira Sumitani , Takanobu Ishihara , Shinji Nagai , Osamu Wakabayashi , Hakaru Mizoguchi
发明人： Akira ENDO , Hideo Hoshino , Kouji Kakizaki , Tamotsu Abe , Akira Sumitani , Takanobu Ishihara , Shinji Nagai , Osamu Wakabayashi , Hakaru Mizoguchi
IPC分类号： G21K5/00
摘要： An extreme ultraviolet light source apparatus provided with a magnetic field forming unit having sufficient capability of protection against ions radiated from plasma while using a relatively small magnetic source. The apparatus includes: a target nozzle for injecting a target material; a driver laser for applying a laser beam to the target material to generate plasma; a collector mirror for collecting extreme ultraviolet light radiated from the plasma; and a magnetic field forming unit including at least one magnetic source and at least one magnetic material having two leading end parts projecting from the at least one magnetic source to face each other with a plasma emission point in between, and forming a magnetic field between a trajectory of the target material and the collector mirror.
摘要翻译： 一种极紫外光源装置，其具有磁场形成单元，该磁场形成单元在使用相对较小的磁源时具有足够的抵抗从等离子体辐射的离子的能力。 该装置包括：用于注射目标材料的目标喷嘴; 用于将激光束施加到目标材料以产生等离子体的驱动器激光器; 用于收集从等离子体辐射的极紫外光的收集镜; 以及磁场形成单元，其包括至少一个磁源和至少一个磁性材料，所述至少一个磁性材料具有从所述至少一个磁源突出的两个前端部分，其间具有等离子体发射点，并在其之间形成磁场 目标材料和收集镜的轨迹。
-
公开(公告)号：US08497489B2
公开(公告)日：2013-07-30
申请号：US13051649
申请日：2011-03-18
IPC分类号： G01K5/00
CPC分类号： G03F7/70033 , H05G2/005 , H05G2/006 , H05G2/008
摘要： A chamber apparatus used with a laser apparatus may include: a chamber provided with at least one inlet for introducing thereinto a laser beam outputted from the laser apparatus; a target supply unit provided to the chamber for supplying a target material to a predetermined region in the chamber; a recovery control unit for instructing the target supply unit to execute recovery operation if a predetermined condition is met; a recovery unit for executing the recovery operation in response to the instruction from the recovery control unit; and a position measuring unit for measuring a position of the target material supplied from the target supply unit into the chamber.
摘要翻译： 与激光装置一起使用的室装置可以包括：设置有至少一个入口的室，用于将从激光装置输出的激光束引入其中; 目标供给单元，其设置在所述室中，用于将目标材料供应到所述室中的预定区域; 恢复控制单元，用于在满足预定条件时指示目标供应单元执行恢复操作; 恢复单元，用于响应于来自恢复控制单元的指令执行恢复操作; 以及位置测量单元，用于测量从目标供应单元供应到室中的目标材料的位置。
-
6.发明申请公开(公告)号：US20120205559A1
公开(公告)日：2012-08-16
申请号：US13351884
申请日：2012-01-17
申请人： Takayuki Yabu , Kouji Kakizaki , Osamu Wakabayashi
发明人： Takayuki Yabu , Kouji Kakizaki , Osamu Wakabayashi
摘要： A target supply device is configured for supplying a target material for generating an extreme ultraviolet (EUV) light. The target supply device comprises a target storage unit for storing at least the target material, and a target discharge unit comprising a surface having an opening from which a through-hole extends to communicate with the target storage unit. The target material is discharged through the opening for generating the EUV light. The surface at least around the opening is formed of a material so that the target material has a contact angle greater than 90 degrees with the surface.
摘要翻译： 目标供给装置被配置为提供用于产生极紫外（EUV）光的目标材料。 目标供给装置包括用于至少存储目标材料的目标存储单元和包括具有开口的表面的目标排出单元，通孔从该开口延伸以与目标存储单元连通。 目标材料通过用于产生EUV光的开口排出。 至少在开口周围的表面由材料形成，使得目标材料具有与表面大于90度的接触角。
-
7.发明申请公开(公告)号：US20120085922A1
公开(公告)日：2012-04-12
申请号：US13253460
申请日：2011-10-05
IPC分类号： G21K5/08
摘要： A chamber apparatus is used in combination with a laser apparatus. The chamber apparatus includes a chamber with an inlet. The inlet is configured for introducing a laser beam into the chamber. A target supply unit is provided to the chamber to supply a target material into the chamber. The target supply unit may electrically be isolated from the chamber. A potential control unit is connected to at least the target supply unit, and configured to control the supply of the target material.
摘要翻译： 腔室装置与激光装置结合使用。 腔室装置包括具有入口的腔室。 入口被配置为将激光束引入腔室。 将目标供应单元提供到室以将目标材料供应到室中。 目标供应单元可以电隔离室。 电势控制单元至少连接到目标供给单元，并且被配置为控制目标材料的供给。
-
公开(公告)号：US20080095209A1
公开(公告)日：2008-04-24
申请号：US11903111
申请日：2007-09-19
申请人： Osamu Wakabayashi , Tsukasa Hori , Takanobu Ishihara , Shinji Nagai , Hakaru Mizoguchi , Kouji Kakizaki
发明人： Osamu Wakabayashi , Tsukasa Hori , Takanobu Ishihara , Shinji Nagai , Hakaru Mizoguchi , Kouji Kakizaki
IPC分类号： H01S3/22
CPC分类号： H01S3/2333 , H01S3/005 , H01S3/036 , H01S3/0384 , H01S3/0385 , H01S3/073 , H01S3/08009 , H01S3/08045 , H01S3/09702 , H01S3/0971 , H01S3/1055 , H01S3/1305 , H01S3/225 , H01S3/2251 , H01S3/2316 , H01S3/2366
摘要： A high efficiency injection device 4, which injects oscillation stage laser light into an optical stable resonator of an amplification stage laser 20, is provided. A discharge electrode 1a is disposed in an oscillation stage laser 10, and is connected to a 12 kHz power supply 15 for discharging the discharge electrode 1a, and also a plurality of pairs of discharge electrodes 2a, 2b are disposed within the optical stable resonator of the amplification stage laser 20, and are connected to 6 kHz power supplies 25a, 25b for discharging the respective electrode pairs 2a, 2b. Discharge voltages are applied alternately to the two pairs of electrodes 2a, 2b in synchronization with the injected light to cause discharge.
摘要翻译： 提供了将振荡级激光注入到放大级激光器20的光稳定谐振器中的高效率注入装置4。 放电电极1a设置在振荡级激光器10中，并且连接到用于放电放电电极1a的12kHz电源15，并且多对放电电极2a，2b布置在 放大级激光器20的光稳定谐振器，并且连接到用于对各个电极对2a，2b进行放电的6kHz电源25a，25b。 与注入的光同步地将放电电压交替地施加到两对电极2a，2b，以引起放电。
-
公开(公告)号：US20090232171A1
公开(公告)日：2009-09-17
申请号：US12382109
申请日：2009-03-09
申请人： Tamotsu Abe , Hideo Hoshino , Akira Endo , Osamu Wakabayashi , Kouji Kakizaki
发明人： Tamotsu Abe , Hideo Hoshino , Akira Endo , Osamu Wakabayashi , Kouji Kakizaki
IPC分类号： H01S3/10
CPC分类号： H01S3/2316 , H01S3/076 , H01S3/10007 , H01S3/2232
摘要： The higher efficiency and lower power consumption are realized in a laser system for generating a high-power short-pulse laser beam. The laser system includes a laser oscillator for generating a pulse laser beam by laser oscillation, plural amplifiers for sequentially inputting the pulse laser beam generated by the laser oscillator and amplifying the pulse laser beam, and a control unit for controlling the laser oscillator to perform burst oscillation and halting an amplification operation of at least one of the plural amplifiers in a burst halt period between burst oscillation periods.
摘要翻译： 在用于产生大功率短脉冲激光束的激光系统中实现更高的效率和更低的功率消耗。 激光系统包括用于通过激光振荡产生脉冲激光束的激光振荡器，用于顺序地输入由激光振荡器产生的脉冲激光束并放大脉冲激光束的多个放大器，以及用于控制激光振荡器进行突发的控制单元 在突发振荡周期之间的突发停止时段中振荡并停止多个放大器中的至少一个的放大操作。
-
公开(公告)号：US08445876B2
公开(公告)日：2013-05-21
申请号：US12603872
申请日：2009-10-22
CPC分类号： G03F7/70891 , G03F7/70033 , G03F7/70141 , G03F7/70175 , G03F7/70191 , G03F7/70575 , G03F7/70591 , G03F7/7085 , H05G2/005
摘要： An extreme ultraviolet (EUV) light source apparatus in which a location or posture shift of an EUV collector mirror can be detected. The apparatus includes: a chamber; a target supply mechanism for supplying a target material into the chamber; a driver laser for irradiating the target material with a laser beam to generate plasma; a collector mirror having a first focal point and a second focal point, for reflecting light, which is generated at the first focal point, toward the second focal point; a splitter optical element provided in an optical path of the light reflected by the collector mirror, for splitting a part of the light reflected by the collector mirror; and an image sensor provided in an optical path of the light split by the splitter optical element, for detecting a profile of the light split by the splitter optical element.
摘要翻译： 可以检测EUV收集镜的位置或姿势偏移的极紫外（EUV）光源装置。 该装置包括：一个室; 用于将目标材料供应到所述室中的目标供给机构; 用于用激光束照射目标材料以产生等离子体的驱动器激光器; 收集器反射镜，具有第一焦点和第二焦点，用于将在第一焦点处产生的光朝向第二焦点反射; 分离器光学元件，设置在由集光镜反射的光的光路中，用于分离由集光镜反射的一部分光; 以及图像传感器，其设置在由分离光学元件分离的光的光路中，用于检测由分离光学元件分离的光的轮廓。
-
-
-
-
-
-
-
-
-
搜索结果
212 条记录 (耗时 0.028 秒)
