Invention Grant
- Patent Title: Mitigation of plasma-inductor termination
- Patent Title (中): 降低等离子体 - 电感器端接
-
Application No.: US12925082Application Date: 2010-10-13
-
Publication No.: US08698401B2Publication Date: 2014-04-15
- Inventor: Harold R. Kaufman , James R. Kahn
- Applicant: Harold R. Kaufman , James R. Kahn
- Applicant Address: US CO Ft. Collins
- Assignee: Kaufman & Robinson, Inc.
- Current Assignee: Kaufman & Robinson, Inc.
- Current Assignee Address: US CO Ft. Collins
- Agent Dean P. Edmundson
- Main IPC: H05B31/26
- IPC: H05B31/26

Abstract:
In accordance with one embodiment of the present invention, the dielectric discharge chamber of a generally axially symmetric ion source has a hollow cylindrical shape. One end of the discharge chamber is closed with a dielectric wall. The working gas is introduced through an aperture in the center of this wall. The ion-optics grids are at the other end of the discharge chamber, which is left open. The inductor is a helical coil of copper conductor that surrounds the cylindrical portion of the dielectric discharge chamber. The modification that produces uniformity about the axis of symmetry is a shorted turn of the helical-coil inductor at the end of the inductor closest to the ion-optics grids.
Public/Granted literature
- US20110163674A1 Mitigation of plasma-inductor termination Public/Granted day:2011-07-07
Information query