公开(公告)号：US20150084496A1

公开(公告)日：2015-03-26

申请号：US13998044

申请日：2013-09-25

Applicant: Harold R. Kaufman ,  James R. Kahn ,  Richard E. Nethery

Inventor： Harold R. Kaufman ,  James R. Kahn ,  Richard E. Nethery

IPC: H01J27/02 ,  H01J9/18 ,  H01J27/14

CPC classification number: H01J27/146 ,  H01J27/14 ,  H01J2237/002

Abstract: In accordance with one embodiment of the present invention, an end-Hall ion source has an electron emitting cathode, an anode, a reflector, an internal pole piece, an external pole piece, a magnetically permeable path, and a magnetic-field generating means located in the permeable path between the two pole pieces. The anode and reflector are enclosed without contact by a thermally conductive cup that has internal passages through which a cooling fluid can flow. The closed end of the cup is located between the reflector and the internal pole piece and the opposite end of the cup is in direct contact with the external pole piece, and wherein the cup is made of a material having a low microhardness, such as copper or aluminum.

Abstract translation: 根据本发明的一个实施例，末端霍尔离子源具有电子发射阴极，阳极，反射器，内部极靴，外部极靴，导磁通路和磁场产生装置 位于两个极片之间的可渗透路径中。 阳极和反射器被没有接触的导热杯封闭，导热杯具有内部通道，冷却流体可以通过该内部通道流动。 杯的封闭端位于反射器和内部极片之间，并且杯的相对端与外部极靴直接接触，并且其中杯由具有低显微硬度的材料制成，例如铜 或铝。

公开(公告)号：US20090309509A1

公开(公告)日：2009-12-17

申请号：US12157586

申请日：2008-06-11

Applicant: Steven J. Geissler ,  James R. Kahn ,  Harold R. Kaufman

Inventor： Steven J. Geissler ,  James R. Kahn ,  Harold R. Kaufman

IPC: H05B41/24

CPC classification number: H05B41/295

Abstract: In accordance with one embodiment of the present invention, there is provided a switch-mode power supply to generate the heating current for a hot-filament electron-emitting cathode. The power supply directly couples, without an output power transformer, the output from a full-bridge converter that operates at an output frequency in the range from ten Hz to tens of Khz to the output terminals of the power supply. A connection to a reference potential that minimizes the potential fluctuation of the cathode is provided by the center tap on an autotransformer connected across the output terminals, where the conductors in the autotransformer are sized for half of the emission current from the cathode rather than the much larger heating current.

Abstract translation: 根据本发明的一个实施例，提供了一种用于产生热丝电子发射阴极的加热电流的开关模式电源。 电源直接耦合来自全桥变换器的输出，无需输出电源变压器，其工作频率范围为10 Hz至几十kHz，输出频率范围为电源输出端。 通过连接在输出端子上的自耦变压器上的中心抽头提供与参考电位的最小化的连接，其中自耦变压器中的导体的尺寸为来自阴极的一半的发射电流，而不是很多 加热电流较大

公开(公告)号：US06238537B1

公开(公告)日：2001-05-29

申请号：US09548756

申请日：2000-04-13

Applicant: James R. Kahn ,  Viacheslav V. Zhurin

Inventor： James R. Kahn ,  Viacheslav V. Zhurin

IPC: C23C1435

CPC classification number: C23C14/228 ,  C23C14/355 ,  H01J37/3402 ,  H01J37/3438

Abstract: In accordance with one specific embodiment of the present invention, the ion assisted deposition source for thin films comprises an axially symmetric discharge region into which an ionizable gas is introduced, a sputter target at one end of that region, an axially symmetric magnetic field within and extending out the opposite and open end of that region, an anode around the circumference of that region, and an electron emitting cathode located near the open end of that region. Particles are sputtered from the sputter target, pass through the discharge region, and are deposited on a deposition substrate located exterior of both the discharge region and the deposition source. A beam of energetic ions from the discharge region bombards the film being deposited to improve the adhesion, density, and other properties of that film. The density of the plasma can be controlled with the emission from the cathode, the emission of sputtered particles from the sputter target can be controlled with the negative potential of that target, while the energy of the ions used to assist in the deposition can be controlled with the positive potential of the anode. The deposition source thus simultaneously generates a flux of sputtered material with which to deposit a film on a substrate and a beam of energetic ions to assist in that deposition, and does so with a simple and economical apparatus.

Abstract translation: 根据本发明的一个具体实施例，用于薄膜的离子辅助沉积源包括轴向对称的放电区域，可电离气体被引入到其中，该区域的一端处的溅射靶， 延伸该区域的相对且开放的端部，围绕该区域的圆周的阳极和位于该区域的开口端附近的电子发射阴极。 颗粒从溅射靶溅射，穿过放电区，并沉积在位于放电区和沉积源两端的沉积衬底上。 来自放电区域的高能离子束轰击沉积的膜以改善该膜的粘附性，密度和其它性质。 可以利用来自阴极的发射来控制等离子体的密度，可以用该靶的负电位来控制来自溅射靶的溅射粒子的发射，而可以控制用于辅助沉积的离子的能量 具有阳极的正电位。 因此，沉积源同时产生溅射材料的通量，通过该通量将薄膜沉积在基底和能量离子束上以辅助沉积，并以简单和经济的装置进行。

公开(公告)号：US5793195A

公开(公告)日：1998-08-11

申请号：US521349

申请日：1995-08-30

Applicant: Harold R. Kaufman ,  Raymond S. Robinson ,  James R. Kahn

Inventor： Harold R. Kaufman ,  Raymond S. Robinson ,  James R. Kahn

IPC: H01J49/02 ,  G01N27/62

CPC classification number: H01J49/025

Abstract: Ion-beam probes of the planar, screened, and multilayer types are shown and described. These probes can detect the arrival of energetic ions and, in the latter type, also detect the arrival of energetic neutral molecules. A specific improvement is the use of a multilayer collection surface behind an aperture to measure the angular distribution of the etching contributions of energetic ions and/or energetic neutral molecules. After use, this multilayer collection surface provides a permanent record of the measurement. The improvement is also suitable for the adverse thermal and ion-etching environment of an energetic ion beam. In one embodiment, the aperture size and distance from the collection surface are such that a theoretical analysis of etch depth behind a straight-edge mask can be used to analyze the experimental results. The etch contour can be accurately reproduced from the measurement of half-maximum half angle, as long as the assumed distribution is incorporated in the measurement process.

Abstract translation: 示出并描述了平面，筛选和多层类型的离子束探针。 这些探针可以检测能量离子的到达，而在后一种类型中也可以检测能量中性分子的到达。 具体的改进是使用孔后面的多层收集表面来测量能量离子和/或能量中性分子的蚀刻贡献的角分布。 使用后，该多层收集表面提供测量的永久记录。 该改进也适用于能量离子束的不利的热和离子蚀刻环境。 在一个实施例中，孔径尺寸和距收集表面的距离使得可以使用直边掩模后面的蚀刻深度的理论分析来分析实验结果。 只要将假定的分布结合在测量过程中，就可以从半最大半角的测量精确地再现蚀刻轮廓。

公开(公告)号：US07843138B2

公开(公告)日：2010-11-30

申请号：US12157586

申请日：2008-06-11

Applicant: Steven J. Geissler ,  James R. Kahn ,  Harold R. Kaufman

Inventor： Steven J. Geissler ,  James R. Kahn ,  Harold R. Kaufman

IPC: H05B39/00

CPC classification number: H05B41/295

Abstract: In accordance with one embodiment of the present invention, there is provided a switch-mode power supply to generate the heating current for a hot-filament electron-emitting cathode. The power supply directly couples, without an output power transformer, the output from a full-bridge converter that operates at an output frequency in the range from ten Hz to tens of Khz to the output terminals of the power supply. A connection to a reference potential that minimizes the potential fluctuation of the cathode is provided by the center tap on an autotransformer connected across the output terminals, where the conductors in the autotransformer are sized for half of the emission current from the cathode rather than the much larger heating current.

Abstract translation: 根据本发明的一个实施例，提供了一种用于产生热丝电子发射阴极的加热电流的开关模式电源。 电源直接耦合来自全桥变换器的输出，无需输出电源变压器，其工作频率范围为10 Hz至几十kHz，输出频率范围为电源输出端。 通过连接在输出端子上的自耦变压器上的中心抽头提供与参考电位的最小化的连接，其中自耦变压器中的导体的尺寸为来自阴极的一半的发射电流，而不是很多 加热电流较大

公开(公告)号：US07728498B2

公开(公告)日：2010-06-01

申请号：US11639639

申请日：2006-12-16

Applicant: Chris M. Shonka ,  James R. Kahn ,  Harold R. Kaufman

Inventor： Chris M. Shonka ,  James R. Kahn ,  Harold R. Kaufman

IPC: H01J1/20

CPC classification number: H01J1/025

Abstract: In accordance with one embodiment, the hollow cathode is comprised of a first tantalum tube, tantalum foil, and a second tantalum tube. The foil is in the form of a spiral winding around the outside of the first tube and is held in place by the second tube, which surrounds the foil. One end of the second tube is approximately flush with one end of the first tube. The other end of the second tube extends to a cathode support through which the working gas flows. To start the cathode, a flow of ionizable inert gas, usually argon, is initiated through the hollow cathode and out the open end of the first tube. An electrical discharge is then started between an external electrode and the first tube. When the first tube is heated to operating temperature, electrons are emitted from the open end of the first tube.

Abstract translation: 根据一个实施例，空心阴极包括第一钽管，钽箔和第二钽管。 箔是围绕第一管的外侧的螺旋缠绕的形式，并且被包围箔的第二管保持在适当的位置。 第二管的一端大致与第一管的一端齐平。 第二管的另一端延伸到阴极支撑件，工作气体通过该支撑件流动。 为了启动阴极，可以通过空心阴极引出电离惰性气体（通常为氩气）流出第一管的开口端。 然后在外部电极和第一管之间开始放电。 当第一管被加热到工作温度时，从第一管的开口端发射电子。

公开(公告)号：US20070222358A1

公开(公告)日：2007-09-27

申请号：US11639639

申请日：2006-12-16

Applicant: Chris M. Shonka ,  James R. Kahn ,  Harold R. Kaufman

Inventor： Chris M. Shonka ,  James R. Kahn ,  Harold R. Kaufman

IPC: H01J1/20 ,  H01J19/14

CPC classification number: H01J1/025

Abstract: In accordance with one embodiment, the hollow cathode is comprised of a first tantalum tube, tantalum foil, and a second tantalum tube. The foil is in the form of a spiral winding around the outside of the first tube and is held in place by the second tube, which surrounds the foil. One end of the second tube is approximately flush with one end of the first tube. The other end of the second tube extends to a cathode support through which the working gas flows. To start the cathode, a flow of ionizable inert gas, usually argon, is initiated through the hollow cathode and out the open end of the first tube. An electrical discharge is then started between an external electrode and the first tube. When the first tube is heated to operating temperature, electrons are emitted from the open end of the first tube.

Abstract translation: 根据一个实施例，空心阴极包括第一钽管，钽箔和第二钽管。 箔是围绕第一管的外侧的螺旋缠绕的形式，并且被包围箔的第二管保持在适当的位置。 第二管的一端大致与第一管的一端齐平。 第二管的另一端延伸到阴极支撑件，工作气体通过该支撑件流动。 为了启动阴极，可以通过空心阴极引出电离惰性气体（通常为氩气）流出第一管的开口端。 然后在外部电极和第一管之间开始放电。 当第一管被加热到工作温度时，从第一管的开口端发射电子。

公开(公告)号：US06682634B1

公开(公告)日：2004-01-27

申请号：US09471662

申请日：1999-12-23

Applicant: James R. Kahn ,  Harold R. Kaufman ,  Viacheslav V. Zhurin ,  David A. Baldwin ,  Todd L. Hylton

Inventor： James R. Kahn ,  Harold R. Kaufman ,  Viacheslav V. Zhurin ,  David A. Baldwin ,  Todd L. Hylton

IPC: C23C1400

CPC classification number: C23C14/46 ,  H01J37/3178 ,  H01J37/34 ,  H01J2237/3146

Abstract: In accordance with one specific embodiment of the present invention, the apparatus for sputter deposition within an evacuated volume comprises a compact ion source to generate ions into which an ionizable gas is introduced and from which ions leave with directed energies near or below the sputtering threshold, a sputter target near that source and located within the beam of ions leaving that source, a sputter target with a grounded shield that defines the target portion exposed to sputtering, and a power supply to bias the target negative relative to ground so that ions are attracted to and sputter the target. Particles sputtered from the target are deposited on a deposition substrate separate from both the ion source and the sputter target. For an insulating target, the target is biased with a radiofrequency power supply and the bias has a mean negative value rather than a direct-current negative value relative to ground. The rate and energy with which the ions arrive at the target determine the rate with which that target is sputtered and the deposition rate on the substrate. In using a compact gridless ion source, the high pressure required for generating ions is confined to the ion source, reducing the pumping gas load. For ion energies at or near the sputtering threshold, the sputtering from extraneous hardware is reduced or eliminated. In addition, the target biases can be low enough to minimize the damage due to energetic neutrals that result from reflection of energetic target ions.

Abstract translation: 根据本发明的一个具体实施例，用于在抽真空体积内溅射沉积的装置包括致密的离子源，以产生离子，其中引入可离子化气体，并且离子离开具有接近或低于溅射阈值的定向能量， 靠近该源并且位于离开该源的离子束内的溅射靶，具有限定暴露于溅射的靶部分的接地屏蔽的溅射靶，以及使靶相对于地离子偏移以使得离子被吸引的电源 对目标进行溅射。 从目标溅射的颗粒沉积在与离子源和溅射靶分离的沉积基底上。 对于绝缘目标，目标通过射频电源偏置，偏置具有相对于地面的平均负值而不是直流负值。 离子到达目标的速率和能量决定了靶溅射的速率和衬底上的沉积速率。 在使用紧凑的无栅离子源时，产生离子所需的高压被限制在离子源中，从而减少泵送气体的负荷。 对于溅射阈值处或附近的离子能量，来自外部硬件的溅射被减少或消除。 此外，目标偏差可以低到足以最小化由于能量目标离子的反射而导致的能量中性粒子的损伤。

公开(公告)号：US06454910B1

公开(公告)日：2002-09-24

申请号：US09960002

申请日：2001-09-21

Applicant: Viacheslav V. Zhurin ,  Harold R. Kaufman ,  James R. Kahn ,  Kirk A. Thompson

Inventor： Viacheslav V. Zhurin ,  Harold R. Kaufman ,  James R. Kahn ,  Kirk A. Thompson

IPC: C23C1434

CPC classification number: C23C14/3442 ,  C23C14/0031 ,  C23C14/354 ,  H01J37/3233 ,  H01J37/3405

Abstract: In accordance with an embodiment of the present invention, apparatus for ion-assisted magnetron deposition takes a form that includes a magnetron, a deposition substrate displaced from the magnetron, and an ion source also displaced from the magnetron and located so that the ion beam from the ion source is directed at the deposition substrate. The ion source is operated without an electron-emitting cathode-neutralizer, the electron current for this function being provided by electrons from the magnetron. In one specific embodiment, the ion source is operated so that the potential of the deposition substrate is maintained close to that of a common ground for the magnetron and the ion source. In another embodiment, the ion source is of the Hall-current type and the discharge current of the ion source is approximately equal in magnitude to the current of the magnetron discharge.

Abstract translation: 根据本发明的实施例，用于离子辅助磁控管沉积的装置采取的形式包括磁控管，从磁控管移位的沉积基板和离子源也从磁控管移位并使其位于离子束 离子源指向沉积衬底。 离子源在没有电子发射阴极中和器的情况下操作，用于该功能的电子电流由来自磁控管的电子提供。 在一个具体实施例中，操作离子源，使得沉积基板的电位保持接近磁控管和离子源的公共接地的电位。 在另一个实施例中，离子源是霍尔电流型，离子源的放电电流大致等于磁控管放电的电流。

公开(公告)号：US06911789B2

公开(公告)日：2005-06-28

申请号：US10379057

申请日：2003-03-04

Applicant: Steven J. Geissler ,  James R. Kahn ,  Harold R. Kaufman ,  Denis M. Shaw

Inventor： Steven J. Geissler ,  James R. Kahn ,  Harold R. Kaufman ,  Denis M. Shaw

IPC: H01J1/13 ,  H01J27/08 ,  H01J37/08 ,  H02M7/5387 ,  H05B37/02

CPC classification number: H01J27/08 ,  H01J1/135 ,  H01J37/08 ,  H02M7/53871

Abstract: In accordance with one embodiment of the present invention, there is provided a switch-mode power supply to generate the heating current for a hot-filament electron-emitting cathode. The power supply directly couples, without an output transformer, the output from a full-bridge converter that operates at an output frequency in the range from ten Hz to ten kHz. A connection to a reference potential that minimizes the potential fluctuation of the cathode is provided by one of the direct-current inputs to the converter.

Abstract translation: 根据本发明的一个实施例，提供了一种用于产生热丝电子发射阴极的加热电流的开关模式电源。 电源直接耦合在不带输出变压器的情况下，全桥变换器的输出工作在10 Hz至10 kHz范围内的输出频率。 通过转换器的直流输入之一提供与参考电位的连接，其使阴极的潜在波动最小化。