发明授权
- 专利标题: Wavelength-classifying type X-ray diffraction device
- 专利标题(中): 波长分类型X射线衍射装置
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申请号: US13170708申请日: 2011-06-28
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公开(公告)号: US08699665B2公开(公告)日: 2014-04-15
- 发明人: Kazuyuki Matsushita , Takuto Sakumura , Yuji Tsuji , Masataka Maeyama , Kimiko Hasegawa
- 申请人: Kazuyuki Matsushita , Takuto Sakumura , Yuji Tsuji , Masataka Maeyama , Kimiko Hasegawa
- 申请人地址: JP Akishima-Shi, Tokyo
- 专利权人: Rigaku Corporation
- 当前专利权人: Rigaku Corporation
- 当前专利权人地址: JP Akishima-Shi, Tokyo
- 代理机构: Buchanan Ingersoll Rooney PC
- 优先权: JP2010-148384 20100629
- 主分类号: G01N23/207
- IPC分类号: G01N23/207
摘要:
A wavelength-classifying type X-ray diffraction device bombards a sample with characteristic X-rays generated from an X-ray generation source, and detects characteristic X-rays diffracted by the sample using an X-ray detector. The X-ray generation source is composed of several metals of different atomic number, respective metals generating several characteristic X-rays of different wavelengths. An X-ray detector is composed of several pixels for receiving X-rays and outputting pulse signals corresponding to X-ray wavelengths. Pixels are respectively furnished with classification circuits. The classification circuits classify and output pixel output signals based on each of characteristic X-ray wavelengths. X-ray intensity is detected on a per-wavelength basis in individual pixels 12. Measurement data based on different wavelength X-rays are acquired simultaneously in just one measurement. Data of diffracted X-rays of different wavelengths are acquired using the entire region of the receiving surface of a two-dimensional detector.
公开/授权文献
- US20110317813A1 WAVELENGTH-CLASSIFYING TYPE X-RAY DIFFRACTION DEVICE 公开/授权日:2011-12-29
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