发明授权
US08703386B2 Metal peroxo compounds with organic co-ligands for electron beam, deep UV and extreme UV photoresist applications
有权
金属过氧化合物与电子束，深UV和极紫外光致抗蚀剂应用的有机共配体
- 专利标题： Metal peroxo compounds with organic co-ligands for electron beam, deep UV and extreme UV photoresist applications
- 专利标题（中）： 金属过氧化合物与电子束，深UV和极紫外光致抗蚀剂应用的有机共配体
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申请号： US13405587申请日： 2012-02-27
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公开(公告)号： US08703386B2公开(公告)日： 2014-04-22
- 发明人: John David Bass , Ho-Cheol Kim , Robert Dennis Miller , Qing Song , Linda Karin Sundberg , Gregory Michael Wallraff
- 申请人： John David Bass , Ho-Cheol Kim , Robert Dennis Miller , Qing Song , Linda Karin Sundberg , Gregory Michael Wallraff
- 申请人地址： US NY Armonk
- 专利权人： International Business Machines Corporation
- 当前专利权人： International Business Machines Corporation
- 当前专利权人地址： US NY Armonk
- 代理商 Michael R. Roberts
- 主分类号： G03F7/00
- IPC分类号： G03F7/00 ; G03F7/004 ; G03F7/029 ; C07C49/92 ; C07C7/00
摘要：
Compositions are disclosed having the formula (3): [C′]k[Ta(O2)x(L′)y] (3), wherein x is an integer of 1 to 4, y is an integer of 1 to 4, Ta(O2)x(L′)y has a charge of 0 to −3, C′ is a counterion having a charge of +1 to +3, k is an integer of 0 to 3, L′ is an oxidatively stable organic ligand having a charge of 0 to −4, and L′ comprises an electron donating functional group selected from the group consisting of carboxylates, alkoxides, amines, amine oxides, phosphines, phosphine oxides, arsine oxides, and combinations thereof. The compositions have utility as high resolution photoresists.
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