发明授权
- 专利标题: Photoelectric conversion device and fabrication method thereof
- 专利标题(中): 光电转换装置及其制造方法
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申请号: US13022827申请日: 2011-02-08
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公开(公告)号: US08704083B2公开(公告)日: 2014-04-22
- 发明人: Shunpei Yamazaki , Kazuo Nishi
- 申请人: Shunpei Yamazaki , Kazuo Nishi
- 申请人地址: JP Atsugi-shi, Kanagawa-ken
- 专利权人: Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人: Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人地址: JP Atsugi-shi, Kanagawa-ken
- 代理机构: Robinson Intellectual Property Law Office, P.C.
- 代理商 Eric J. Robinson
- 优先权: JP2010-028310 20100211
- 主分类号: H01L31/075
- IPC分类号: H01L31/075
摘要:
In a thin film photoelectric conversion deice fabricated by addition of a catalyst element with the use of a solid phase growth method, defects such as a short circuit or leakage of current are suppressed. A catalyst material which promotes crystallization of silicon is selectively added to a second silicon semiconductor layer formed over a first silicon semiconductor layer having one conductivity type, the second silicon semiconductor layer is partly crystallized by a heat treatment, a third silicon semiconductor layer having a conductivity type opposite to the one conductivity type is stacked, and element isolation is performed at a region in the second silicon semiconductor layer to which a catalyst material is not added, so that a left catalyst material is prevented from being diffused again, and defects such as a short circuit or leakage of current are suppressed.
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