Invention Grant
US08728708B2 Photosensitive resin composition, oxime sulfonate compound, method for forming cured film, cured film, organic EL display device, and liquid crystal display device
有权
光敏树脂组合物,肟磺酸盐化合物,固化膜形成方法,固化膜,有机EL显示装置和液晶显示装置
- Patent Title: Photosensitive resin composition, oxime sulfonate compound, method for forming cured film, cured film, organic EL display device, and liquid crystal display device
- Patent Title (中): 光敏树脂组合物,肟磺酸盐化合物,固化膜形成方法,固化膜,有机EL显示装置和液晶显示装置
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Application No.: US13779419Application Date: 2013-02-27
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Publication No.: US08728708B2Publication Date: 2014-05-20
- Inventor: Kyouhei Sakita , Wataru Kikuchi , Masatoshi Yumoto , Masanori Hikita
- Applicant: Fujifilm Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2010-192666 20100830; JP2010-192674 20100830; JP2011-001869 20110107; JP2011-161197 20110722
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/004 ; G03F7/029 ; C07D495/00 ; C07D307/92

Abstract:
Disclosed is a photosensitive resin composition comprising: (Component A) an oxime sulfonate compound represented by Formula (1); (Component B) a resin comprising a constituent unit having an acid-decomposable group that is decomposed by an acid to form a carboxyl group or a phenolic hydroxy group; and (Component C) a solvent wherein in Formula (1) R1 denotes an alkyl group, an aryl group, or a heteroaryl group, each R2 independently denotes a hydrogen atom, an alkyl group, an aryl group, or a halogen atom, Ar1 denotes an o-arylene group or an o-heteroarylene group, X denotes O or S, and n denotes 1 or 2, provided that of two or more R2s present in the compound, at least one denotes an alkyl group, an aryl group, or a halogen atom.
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