Invention Grant
US08743357B2 Light source device, surface inspecting apparatus using the device, and method for calibrating surface inspecting apparatus using the device
有权
光源装置,使用该装置的表面检查装置以及使用该装置校准表面检查装置的方法
- Patent Title: Light source device, surface inspecting apparatus using the device, and method for calibrating surface inspecting apparatus using the device
- Patent Title (中): 光源装置,使用该装置的表面检查装置以及使用该装置校准表面检查装置的方法
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Application No.: US13058081Application Date: 2009-07-15
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Publication No.: US08743357B2Publication Date: 2014-06-03
- Inventor: Shigeru Matsui , Mizuki Oku
- Applicant: Shigeru Matsui , Mizuki Oku
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: McDermott Will & Emery LLP
- Priority: JP2008-204969 20080808
- International Application: PCT/JP2009/063141 WO 20090715
- International Announcement: WO2010/016386 WO 20100211
- Main IPC: G01N21/00
- IPC: G01N21/00 ; G02B27/20

Abstract:
A surface inspecting apparatus can inspect a smaller defect by using a PSL of a smaller particle size. However, the particle size of the PSL is restricted. In the conventional surface inspecting apparatus, therefore, no consideration has been taken as to how to inspect the defect of such a small particle size as is not set in the PSL which will be needed in the near future in an inspection of a semiconductor manufacturing step. The invention has a light source device for generating light which simulated at least one of a wavelength, a light intensity, a time-dependent change of the light intensity, and a polarization of light which was scattered, diffracted, or reflected by an inspection object, and the light is inputted to a photodetector of the surface inspecting apparatus. The smaller defect can be inspected.
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