Invention Grant
- Patent Title: System and method for pedestal adjustment
- Patent Title (中): 基座调整系统及方法
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Application No.: US13766230Application Date: 2013-02-13
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Publication No.: US08747560B2Publication Date: 2014-06-10
- Inventor: Richard Collins , Kailash Kiran Patalay , Jean Vatus , Zhepeng Cong
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Kilpatrick Townsend & Stockton LLP
- Main IPC: C23C16/00
- IPC: C23C16/00 ; C23C16/50 ; C23F1/00 ; H01L21/306

Abstract:
A pedestal positioning assembly system for use in a substrate processing system includes a pedestal rigidly attached to a pedestal shaft, a reference rigidly attached to the substrate processing system, a lateral adjustment assembly to adjust a lateral location of the pedestal relative to the reference, and a vertical adjustment assembly to adjust a tilt of the pedestal relative to the reference. The lateral adjustment assembly and the vertical adjustment assembly are external to a processing chamber and are coupled to the pedestal disposed within the processing chamber through the pedestal shaft. The reference can be a ring and the lateral adjustment assembly substantially centers the pedestal within the ring. A method of adjusting a pedestal includes leveling the pedestal, translating the pedestal, calibrating the pedestal height to a preheat ring level, and checking the level and location of the pedestal while rotating the pedestal.
Public/Granted literature
- US20130152859A1 SYSTEM AND METHOD FOR PEDESTAL ADJUSTMENT Public/Granted day:2013-06-20
Information query
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