公开(公告)号：US20140376898A1

公开(公告)日：2014-12-25

申请号：US14258410

申请日：2014-04-22

Applicant: Applied Materials, Inc.

Inventor： Kin Pong Lo ,  Paul Brillhart ,  Balasubramanian Ramachandran ,  Satheesh Kuppurao ,  Daniel Redfield ,  Joseph M. Ranish ,  James Francis Mack ,  Kailash Kiran Patalay ,  Michael Olsen ,  Eddie Feigel ,  Richard Halpin ,  Brett Vetorino

IPC: H05B3/00 ,  H01L21/67

CPC classification number: H05B3/0047 ,  H01L21/67115

Abstract: Embodiments of the disclosure generally relate to a reflector for use in a thermal processing chamber. In one embodiment, the thermal processing chamber generally includes an upper dome, a lower dome opposing the upper dome, the upper dome and the lower dome defining an internal volume of the processing chamber, a substrate support disposed within the internal volume, and a reflector positioned above and proximate to the upper dome, wherein the reflector has a heat absorptive coating layer deposited on a side of the reflector facing the substrate support.

Abstract translation: 本公开的实施例一般涉及用于热处理室的反射器。 在一个实施例中，热处理室通常包括上圆顶，与上圆顶相对的下圆顶，上圆顶和下圆顶，其限定处理室的内部体积，设置在内部体积内的基板支撑件和反射器 定位在上部圆顶上方并且靠近上部圆顶，其中反射器具有沉积在面向基板支撑件的反射器的侧面上的热吸收涂层。

公开(公告)号：US10345155B2

公开(公告)日：2019-07-09

申请号：US15665545

申请日：2017-08-01

Applicant: Applied Materials, Inc.

Inventor： Kailash Kiran Patalay ,  Aaron Muir Hunter

IPC: G01K15/00 ,  G01K1/00 ,  G01K13/00 ,  G01J5/10 ,  H01L21/67 ,  G01J5/00

Abstract: The embodiments described herein generally relate to systems for noise compensation for proper temperature detection in thermal processing chambers and devices for achieving the same. In one embodiment, a system is disclosed herein. The system includes a processing chamber, a substrate, a pyrometer, and a controller. The processing chamber is configured to process a substrate. The substrate support is disposed in the processing chamber. The pyrometer is positioned to receive radiation emitted by a substrate or a component of the processing chamber and generating a pyrometer signal indicative of the received radiation. The controller is configured to subtract a time invariant noise component and a time variant noise component from the pyrometer signal during processing of a substrate.

公开(公告)号：US09832816B2

公开(公告)日：2017-11-28

申请号：US14258410

申请日：2014-04-22

Applicant: Applied Materials, Inc.

Inventor： Kin Pong Lo ,  Paul Brillhart ,  Balasubramanian Ramachandran ,  Satheesh Kuppurao ,  Daniel Redfield ,  Joseph M. Ranish ,  James Francis Mack ,  Kailash Kiran Patalay ,  Michael Olsen ,  Eddie Feigel ,  Richard Halpin ,  Brett Vetorino

IPC: G02B5/08 ,  H05B3/00 ,  H01L21/67

CPC classification number: H05B3/0047 ,  H01L21/67115

Abstract: Embodiments of the disclosure generally relate to a reflector for use in a thermal processing chamber. In one embodiment, the thermal processing chamber generally includes an upper dome, a lower dome opposing the upper dome, the upper dome and the lower dome defining an internal volume of the processing chamber, a substrate support disposed within the internal volume, and a reflector positioned above and proximate to the upper dome, wherein the reflector has a heat absorptive coating layer deposited on a side of the reflector facing the substrate support.

公开(公告)号：US09739666B2

公开(公告)日：2017-08-22

申请号：US14257665

申请日：2014-04-21

Applicant: Applied Materials, Inc.

Inventor： Kailash Kiran Patalay ,  Aaron Muir Hunter

IPC: G01K15/00 ,  G01J5/00 ,  G01K13/00 ,  G01J5/10 ,  H01L21/67

CPC classification number: G01J5/10 ,  G01J2005/0048 ,  H01L21/67115 ,  H01L21/67248

Abstract: The embodiments described herein generally relate to methods of noise compensation for proper temperature detection in thermal processing chambers and devices for achieving the same. Methods can include determining noise produced by a lamp zone and extrapolating the noise from the detected photocurrent. Devices can include a processing chamber, a substrate support disposed in the processing chamber, the substrate support having a high thermal mass, a pyrometer below the substrate support and oriented to view radiation emitted by the substrate and a controller configured to subtract a time invariant noise component and a time variant noise component from the pyrometer signal.

公开(公告)号：US08747560B2

公开(公告)日：2014-06-10

申请号：US13766230

申请日：2013-02-13

Applicant: Applied Materials, Inc.

Inventor： Richard Collins ,  Kailash Kiran Patalay ,  Jean Vatus ,  Zhepeng Cong

IPC: C23C16/00 ,  C23C16/50 ,  C23F1/00 ,  H01L21/306

CPC classification number: H01L21/68 ,  C30B25/12 ,  H01L21/67259 ,  H01L21/68785 ,  H01L21/68792

Abstract: A pedestal positioning assembly system for use in a substrate processing system includes a pedestal rigidly attached to a pedestal shaft, a reference rigidly attached to the substrate processing system, a lateral adjustment assembly to adjust a lateral location of the pedestal relative to the reference, and a vertical adjustment assembly to adjust a tilt of the pedestal relative to the reference. The lateral adjustment assembly and the vertical adjustment assembly are external to a processing chamber and are coupled to the pedestal disposed within the processing chamber through the pedestal shaft. The reference can be a ring and the lateral adjustment assembly substantially centers the pedestal within the ring. A method of adjusting a pedestal includes leveling the pedestal, translating the pedestal, calibrating the pedestal height to a preheat ring level, and checking the level and location of the pedestal while rotating the pedestal.

Abstract translation: 用于基板处理系统的基座定位组件系统包括刚性地连接到基座轴的基座，刚性地附接到基板处理系统的基准，横向调整组件，用于调节基座相对于基准的横向位置，以及 垂直调节组件，用于调节基座相对于基准的倾斜。 横向调节组件和垂直调节组件位于处理室的外部，并且通过基座轴联接到设置在处理室内的基座。 参考可以是环，并且横向调节组件使基座在环内基本上居中。 一种调节基座的方法包括调平基座，平移基座，将基座高度校准到预热环水平面，以及在旋转基座时检查基座的水平和位置。

公开(公告)号：US20130152859A1

公开(公告)日：2013-06-20

申请号：US13766230

申请日：2013-02-13

Applicant: Applied Materials, Inc.

Inventor： Richard O. Collins ,  Kailash Kiran Patalay ,  Jean R. Vatus ,  Zhepeng Cong

IPC: H01L21/68

CPC classification number: H01L21/68 ,  C30B25/12 ,  H01L21/67259 ,  H01L21/68785 ,  H01L21/68792

Abstract: A pedestal positioning assembly system for use in a substrate processing system includes a pedestal rigidly attached to a pedestal shaft, a reference rigidly attached to the substrate processing system, a lateral adjustment assembly to adjust a lateral location of the pedestal relative to the reference, and a vertical adjustment assembly to adjust a tilt of the pedestal relative to the reference. The lateral adjustment assembly and the vertical adjustment assembly are external to a processing chamber and are coupled to the pedestal disposed within the processing chamber through the pedestal shaft. The reference can be a ring and the lateral adjustment assembly substantially centers the pedestal within the ring. A method of adjusting a pedestal includes leveling the pedestal, translating the pedestal, calibrating the pedestal height to a preheat ring level, and checking the level and location of the pedestal while rotating the pedestal.

公开(公告)号：US10306708B2

公开(公告)日：2019-05-28

申请号：US15824489

申请日：2017-11-28

Applicant: Applied Materials, Inc.

Inventor： Kin Pong Lo ,  Paul Brillhart ,  Balasubramanian Ramachandran ,  Satheesh Kuppurao ,  Daniel Redfield ,  Joseph M. Ranish ,  James Francis Mack ,  Kailash Kiran Patalay ,  Michael Olsen ,  Eddie Feigel ,  Richard Halpin ,  Brett Vetorino

IPC: G02B5/08 ,  H05B3/00 ,  H01L21/67

Abstract: Embodiments of the disclosure generally relate to a reflector for use in a thermal processing chamber. In one embodiment, the thermal processing chamber generally includes an upper dome, a lower dome opposing the upper dome, the upper dome and the lower dome defining an internal volume of the processing chamber, a substrate support disposed within the internal volume, and a reflector positioned above and proximate to the upper dome, wherein the reflector has a heat absorptive coating layer deposited on a side of the reflector facing the substrate support.

公开(公告)号：US09768043B2

公开(公告)日：2017-09-19

申请号：US14132215

申请日：2013-12-18

Applicant: Applied Materials, Inc.

Inventor： Anzhong Chang ,  Paul Brillhart ,  Surajit Kumar ,  Satheesh Kuppurao ,  Mehmet Tugrul Samir ,  David K. Carlson ,  Steve Aboagye ,  Anh N. Nguyen ,  Kailash Kiran Patalay ,  Joseph M. Ranish ,  Oleg Serebryanov ,  Dongming Iu ,  Shu-Kwan Lau ,  Zuoming Zhu ,  Herman Diniz

IPC: A21B2/00 ,  H01L21/67 ,  C23C16/455

CPC classification number: H01L21/67115 ,  C23C16/45504

Abstract: Embodiments of the present disclosure relate to a dome assembly. The dome assembly includes an upper dome including a central window, and an upper peripheral flange engaging the central window at a circumference of the central window, wherein a tangent line on an inside surface of the central window that passes through an intersection of the central window and the upper peripheral flange is at an angle of about 8° to about 16° with respect to a planar upper surface of the peripheral flange, a lower dome comprising a lower peripheral flange and a bottom connecting the lower peripheral flange with a central opening, wherein a tangent line on an outside surface of the bottom that passes through an intersection of the bottom and the lower peripheral flange is at an angle of about 8° to about 16° with respect to a planar bottom surface of the lower peripheral flange.