Invention Grant
- Patent Title: Non-vacuum method for fabrication of a photovoltaic absorber layer
- Patent Title (中): 用于制造光伏吸收层的非真空方法
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Application No.: US13198744Application Date: 2011-08-05
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Publication No.: US08748216B2Publication Date: 2014-06-10
- Inventor: Wei Guo , Yu Jin , Bing Liu , Yong Che , Kevin V. Hagedorn
- Applicant: Wei Guo , Yu Jin , Bing Liu , Yong Che , Kevin V. Hagedorn
- Applicant Address: US MI Ann Arbor
- Assignee: IMRA America, Inc.
- Current Assignee: IMRA America, Inc.
- Current Assignee Address: US MI Ann Arbor
- Agency: Dickinson Wright PLLC
- Main IPC: H01L31/18
- IPC: H01L31/18 ; H01L31/032

Abstract:
The present invention provides a non-vacuum method of depositing a photovoltaic absorber layer based on electrophoretic deposition of a mixture of nanoparticles with a controlled atomic ratio between the elements. The nanoparticles are first dispersed in a liquid medium to form a colloidal suspension and then electrophoretically deposited onto a substrate to form a thin film photovoltaic absorber layer. The absorber layer may be subjected to optional post-deposition treatments for photovoltaic absorption.
Public/Granted literature
- US20120098032A1 NON-VACUUM METHOD FOR FABRICATION OF A PHOTOVOLTAIC ABSORBER LAYER Public/Granted day:2012-04-26
Information query
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