An immersion lithography apparatus including a container, at least a liquid, a platform, a fixture, a roller, a light source, and a filter is provided. The container includes a bottom plate, a plurality of side plates, and a bearing hole penetrated through one of the side plates. The liquid is filled in the container. The platform is immersed in the liquid. The platform includes a pair of axles. The axles are parallel to the bottom plate. One of the axles passes through the bearing hole. The fixture is mounted on the platform for clamping a mask and a wafer. The roller is connected to the axle, passes through the bearing hole, and is operated to rotate the connected axle. The light source generates ultraviolet light to incident on the mask and the wafer. The filter is located between the light source and the fixture.