发明授权
US08760625B2 Lithographic apparatus, aberration detector and device manufacturing method
有权
光刻设备，像差检测器和器件制造方法
- 专利标题： Lithographic apparatus, aberration detector and device manufacturing method
- 专利标题（中）： 光刻设备，像差检测器和器件制造方法
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申请号： US13169666申请日： 2011-06-27
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公开(公告)号： US08760625B2公开(公告)日： 2014-06-24
- 发明人: Wilhelmus Jacobus Maria Rooijakkers
- 申请人： Wilhelmus Jacobus Maria Rooijakkers
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Sterne, Kessler, Goldstein & Fox P.L.L.C.
- 主分类号： G03B27/52
- IPC分类号： G03B27/52 ; G03F7/20 ; G01M11/02
摘要：
An aberration detector for a lithographic apparatus is used. An imaging device captures an image of at least one pinhole feature of a target projected onto the imaging device by the projection system of the lithographic apparatus at two different locations separated in a direction parallel to the optical axis of the projection system. A controller obtains a representation of the aberration of the projection system from the captured images.
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