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1.发明授权公开(公告)号：US08760625B2
公开(公告)日：2014-06-24
申请号：US13169666
申请日：2011-06-27
CPC分类号： G03F7/706 , G01M11/0242 , G01M11/0264 , G03F7/70216 , G03F7/70591 , G03F7/70758 , G03F7/7085
摘要： An aberration detector for a lithographic apparatus is used. An imaging device captures an image of at least one pinhole feature of a target projected onto the imaging device by the projection system of the lithographic apparatus at two different locations separated in a direction parallel to the optical axis of the projection system. A controller obtains a representation of the aberration of the projection system from the captured images.
摘要翻译： 使用光刻设备的像差检测器。 成像装置通过光刻设备的投影系统在与投影系统的光轴平行的方向上分离的两个不同位置捕获投射到成像装置上的目标的至少一个针孔特征的图像。 控制器从捕获的图像获得投影系统的像差的表示。
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公开(公告)号：US08269186B2
公开(公告)日：2012-09-18
申请号：US13331140
申请日：2011-12-20
IPC分类号： G01J1/42
CPC分类号： H01J40/02 , G03F7/70575 , G03F7/7085
摘要： A method for detecting radiation. The radiation detector includes a plurality of Faraday cups. Each Faraday cup being provided with a cover. Each cover comprising a window arrangement through which the radiation may pass into the Faraday cup. The window arrangement of each cover being different for each Faraday cup. Each Faraday cup housing a target configured to emit photoelectrons if the radiation is incident upon the target.
摘要翻译： 一种检测辐射的方法。 辐射检测器包括多个法拉第杯。 每个法拉第杯都配有一个盖子。 每个盖子包括一个窗口装置，辐射可通过该窗口装置进入法拉第杯。 每个盖子的窗口布置对于每个法拉第杯是不同的。 每个法拉第杯容纳目标，如果辐射入射在目标上，则其配置为发射光电子。
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3.发明申请公开(公告)号：US20100118288A1
公开(公告)日：2010-05-13
申请号：US11922020
申请日：2006-06-13
申请人： Marcus Adrianus Van De Kerkhof , Wilhelmus Petrus De Boeij , Hendrikus Robertus Marie Van Greevenbroek , Michel Fransois Hubert Klaassen , Haico Victor Kok , Martijn Gerard Dominique Wehrens , Tammo Uitterdijk , Wilhelmus Jacobus Maria Rooijakkers , Johannes Maria Kuiper , Leon Van Dooren , Jacob Sonneveld , Erwin Johannes Martinus Giling
发明人： Marcus Adrianus Van De Kerkhof , Wilhelmus Petrus De Boeij , Hendrikus Robertus Marie Van Greevenbroek , Michel Fransois Hubert Klaassen , Haico Victor Kok , Martijn Gerard Dominique Wehrens , Tammo Uitterdijk , Wilhelmus Jacobus Maria Rooijakkers , Johannes Maria Kuiper , Leon Van Dooren , Jacob Sonneveld , Erwin Johannes Martinus Giling
CPC分类号： G01M11/0264 , G03F7/70566 , G03F7/706 , G03F7/7085
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a polarization sensor configured at least in part to couple to a reticle stage, wherein components of the reticle polarization sensor can be loaded and unloaded in the lithographic apparatus in the manner used for conventional reticles. In one configuration an active reticle tool includes a rotatable retarder configured to vary the retardation applied to polarized light received from a field point in the illumination system. In another configuration, a passive reticle tool is configured as an array of polarization sensor modules, where the amount of retardation applied to received light by fixed retarders varies according to position of the polarization sensor module. Accordingly, a plurality of retardation conditions for light received at a given field point can be measured, wherein a complete determination of a polarization state of the light at the given field point can be determined. In another configuration, the polarization sensor is configured to measure the effect of a projection lens on a polarization state of light passing through the projection lens.
摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统; 至少部分地配置为耦合到掩模版平台的极化传感器，其中所述光罩偏振传感器的部件可以以用于常规掩模版的方式在光刻设备中加载和卸载。 在一种配置中，有源掩模版工具包括可旋转延迟器，其被配置为改变施加到照明系统中的场点所接收的偏振光的延迟。 在另一种配置中，被动掩模版工具被配置为偏振传感器模块的阵列，其中由固定延迟器施加到接收光的延迟量根据偏振传感器模块的位置而变化。 因此，可以测量在给定场点处接收的光的多个延迟条件，其中可以确定在给定场点处的光的偏振状态的完全确定。 在另一种配置中，偏振传感器被配置为测量投影透镜对通过投影透镜的光的偏振状态的影响。
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公开(公告)号：US08124939B2
公开(公告)日：2012-02-28
申请号：US12859583
申请日：2010-08-19
IPC分类号： G01J1/42
CPC分类号： H01J40/02 , G03F7/70575 , G03F7/7085
摘要： A radiation detector detects radiation. The radiation detector includes a plurality of Faraday cups. Each Faraday cup being provided with a cover. Each cover comprising a window arrangement through which the radiation may pass into the Faraday cup. The window arrangement of each cover being different for each Faraday cup. Each Faraday cup housing a target configured to emit photoelectrons if the radiation is incident upon the target.
摘要翻译： 辐射检测器检测辐射。 辐射检测器包括多个法拉第杯。 每个法拉第杯都配有一个盖子。 每个盖子包括一个窗口装置，辐射可通过该窗口装置进入法拉第杯。 每个盖子的窗口布置对于每个法拉第杯是不同的。 每个法拉第杯容纳目标，如果辐射入射在目标上，则其配置为发射光电子。
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公开(公告)号：US20110220806A1
公开(公告)日：2011-09-15
申请号：US12859583
申请日：2010-08-19
IPC分类号： G01J1/42
CPC分类号： H01J40/02 , G03F7/70575 , G03F7/7085
摘要： A radiation detector detects radiation. The radiation detector includes a plurality of Faraday cups. Each Faraday cup being provided with a cover. Each cover comprising a window arrangement through which the radiation may pass into the Faraday cup. The window arrangement of each cover being different for each Faraday cup. Each Faraday cup housing a target configured to emit photoelectrons if the radiation is incident upon the target.
摘要翻译： 辐射检测器检测辐射。 辐射检测器包括多个法拉第杯。 每个法拉第杯都配有一个盖子。 每个盖子包括一个窗口装置，辐射可通过该窗口装置进入法拉第杯。 每个盖子的窗口布置对于每个法拉第杯是不同的。 每个法拉第杯容纳目标，如果辐射入射在目标上，则其配置为发射光电子。
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6.发明申请Passive reticle tool, a lithographic apparatus and a method of patterning a device in a lithography tool 审中-公开无源光罩工具，光刻设备和在光刻工具中构图设备的方法公开(公告)号：US20100182582A1
公开(公告)日：2010-07-22
申请号：US11922018
申请日：2006-06-13
申请人： Marcus Adrianus Van De Kerkhof , Wilhelmus Petrus De Boeij , Hendrikus Robertus Marie Van Greevenbroek , Michel Fransois Hubert Klaassen , Haico Victor Kok , Martijn Gerard Dominique Wehrens , Tammo Uitterdijk , Wilhelmus Jacobus Maria Rooijakkers , Johannes Maria Kuiper , Leon Van Dooren , Jacob Sonneveld , Erwin Johannes Martinus Giling
发明人： Marcus Adrianus Van De Kerkhof , Wilhelmus Petrus De Boeij , Hendrikus Robertus Marie Van Greevenbroek , Michel Fransois Hubert Klaassen , Haico Victor Kok , Martijn Gerard Dominique Wehrens , Tammo Uitterdijk , Wilhelmus Jacobus Maria Rooijakkers , Johannes Maria Kuiper , Leon Van Dooren , Jacob Sonneveld , Erwin Johannes Martinus Giling
CPC分类号： G01M11/0264 , G03F7/70566 , G03F7/706 , G03F7/7085
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a polarization sensor configured at least in part to couple to a reticle stage, wherein components of the reticle polarization sensor can be loaded and unloaded in the lithographic apparatus in the manner used for conventional reticles. In one configuration an active reticle tool includes a rotatable retarder configured to vary the retardation applied to polarized light received from a field point in the illumination system. In another configuration, a passive reticle tool is configured as an array of polarization sensor modules, where the amount of retardation applied to received light by fixed retarders varies according to position of the polarization sensor module. Accordingly, a plurality of retardation conditions for light received at a given field point can be measured, wherein a complete determination of a polarization state of the light at the given field point can be determined. In another configuration, the polarization sensor is configured to measure the effect of a projection lens on a polarization state of light passing through the projection lens.
摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统; 至少部分地配置为耦合到掩模版平台的偏振传感器，其中所述光罩极化传感器的部件可以以用于常规掩模版的方式在光刻设备中加载和卸载。 在一种配置中，有源掩模版工具包括可旋转延迟器，其被配置为改变施加到照明系统中的场点所接收的偏振光的延迟。 在另一种配置中，被动掩模版工具被配置为偏振传感器模块的阵列，其中由固定延迟器施加到接收光的延迟量根据偏振传感器模块的位置而变化。 因此，可以测量在给定场点处接收的光的多个延迟条件，其中可以确定在给定场点处的光的偏振状态的完全确定。 在另一种配置中，偏振传感器被配置为测量投影透镜对通过投影透镜的光的偏振状态的影响。
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7.发明申请Lithographic Apparatus, Method for Determining at Least One Polarization Property Thereof, Polarization Analyzer and Polarization Sensor Thereof 审中-公开平版印刷设备，用于确定其极化特性的方法，极化分析仪和极化传感器公开(公告)号：US20100045956A1
公开(公告)日：2010-02-25
申请号：US11922056
申请日：2006-06-13
申请人： Marcus Adrianus Van De Kerkhof , Wilhelmus Petrus De Boeij , Hendrikus Robertus Marie Van Greevenbroek , Michel Fransois Hubert Klaassen , Haico Victor Kok , Martijn Gerard Dominique Wehrens , Tammo Uitterdijk , Wilhelmus Jacobus Maria Rooijakkers , Johannes Maria Kuiper , Leon Van Dooren , Jacob Sonneveld , Erwin Johannes Martinus Giling
发明人： Marcus Adrianus Van De Kerkhof , Wilhelmus Petrus De Boeij , Hendrikus Robertus Marie Van Greevenbroek , Michel Fransois Hubert Klaassen , Haico Victor Kok , Martijn Gerard Dominique Wehrens , Tammo Uitterdijk , Wilhelmus Jacobus Maria Rooijakkers , Johannes Maria Kuiper , Leon Van Dooren , Jacob Sonneveld , Erwin Johannes Martinus Giling
CPC分类号： G01M11/0264 , G03F7/70566 , G03F7/706 , G03F7/7085
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a polarization sensor configured at least in part to couple to a reticle stage, wherein components of the reticle polarization sensor can be loaded and unloaded in the lithographic apparatus in the manner used for conventional reticles. In one configuration an active reticle tool includes a rotatable retarder configured to vary the retardation applied to polarized light received from a field point in the illumination system. In another configuration, a passive reticle tool is configured as an array of polarization sensor modules, where the amount of retardation applied to received light by fixed retarders varies according to position of the polarization sensor module. Accordingly, a plurality of retardation conditions for light received at a given field point can be measured, wherein a complete determination of a polarization state of the light at the given field point can be determined. In another configuration, the polarization sensor is configured to measure the effect of a projection lens on a polarization state of light passing through the projection lens.
摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统; 至少部分地配置为耦合到掩模版平台的极化传感器，其中所述光罩偏振传感器的部件可以以用于常规掩模版的方式在光刻设备中加载和卸载。 在一种配置中，有源掩模版工具包括可旋转延迟器，其被配置为改变施加到照明系统中的场点所接收的偏振光的延迟。 在另一种配置中，被动掩模版工具被配置为偏振传感器模块的阵列，其中由固定延迟器施加到接收光的延迟量根据偏振传感器模块的位置而变化。 因此，可以测量在给定场点处接收的光的多个延迟条件，其中可以确定在给定场点处的光的偏振状态的完全确定。 在另一种配置中，偏振传感器被配置为测量投影透镜对通过投影透镜的光的偏振状态的影响。
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