Invention Grant
- Patent Title: Apparatus and method for generating extreme ultra violet radiation
- Patent Title (中): 用于产生极紫外辐射的装置和方法
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Application No.: US14103381Application Date: 2013-12-11
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Publication No.: US08779403B2Publication Date: 2014-07-15
- Inventor: Dong-Gun Lee , Eok-Bong Kim , Jong-Ju Park , Seong-Sue Kim
- Applicant: Samsung Electronics Co., Ltd. , Fine Semitech Corp.
- Applicant Address: KR Suwon-si, Gyeonggi-do KR Hwaseong-si, Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.,Fine Semitech Corp.
- Current Assignee: Samsung Electronics Co., Ltd.,Fine Semitech Corp.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do KR Hwaseong-si, Gyeonggi-do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2012-0148235 20121218
- Main IPC: G01J1/42
- IPC: G01J1/42
Abstract:
An apparatus and a method for generating extreme ultra violet radiation are provided. The apparatus for generating extreme ultra violet radiation includes a light source, a first reflecting mirror on which source light emitted from the light source is incident, a second reflecting mirror on which first reflected light reflected by the first reflecting mirror is incident, a focus mirror on which second reflected light reflected by the second reflecting mirror is incident, the focus mirror reflecting third reflected light back to the second reflecting mirror, and a gas cell on which fourth reflected light reflected by the second reflecting mirror is incident.
Public/Granted literature
- US20140166907A1 APPARATUS AND METHOD FOR GENERATING EXTREME ULTRA VIOLET RADIATION Public/Granted day:2014-06-19
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