-
公开(公告)号：US20140166907A1
公开(公告)日：2014-06-19
申请号：US14103381
申请日：2013-12-11
发明人： Dong-Gun LEE , Eok-Bong KIM , Jong-Ju PARK , Seong-Sue KIM
IPC分类号： H05G2/00
摘要： An apparatus and a method for generating extreme ultra violet radiation are provided. The apparatus for generating extreme ultra violet radiation includes a light source, a first reflecting mirror on which source light emitted from the light source is incident, a second reflecting mirror on which first reflected light reflected by the first reflecting mirror is incident, a focus mirror on which second reflected light reflected by the second reflecting mirror is incident, the focus mirror reflecting third reflected light back to the second reflecting mirror, and a gas cell on which fourth reflected light reflected by the second reflecting mirror is incident.
摘要翻译： 提供了一种用于产生极紫外辐射的装置和方法。 用于产生极紫外线辐射的装置包括光源，从光源发射的光源入射的第一反射镜，由第一反射镜反射的第一反射光入射的第二反射镜，聚焦反射镜 在第二反射镜反射的第二反射光入射到其上的情况下，将第三反射光反射回第二反射镜的聚焦镜和由第二反射镜反射的第四反射光入射的气室。
-
公开(公告)号：US20220262028A1
公开(公告)日：2022-08-18
申请号：US17476997
申请日：2021-09-16
申请人： FINE SEMITECH CORP.
发明人： Sung Chul JEON , Dong Young SHIN , Sun Woo LEE
摘要： An apparatus and method for applying a multi-component curable composition is disclosed. The method for applying a multi-component curable composition includes a) applying a plurality of fluids constituting the multi-component curable composition to a surface of a bonding target object layer by layer, b) acquiring a two-dimensional image of all the fluids applied layer by layer using an image sensor, c) measuring a height of all the fluids applied layer by layer using a distance sensor, and d) calculating a total volume of the multi-component curable composition by using the two-dimensional image and height of the fluids obtained in b) and c).
-
公开(公告)号：US09436077B2
公开(公告)日：2016-09-06
申请号：US13827542
申请日：2013-03-14
发明人： Jeong jin Kim , Bum hyun An , Chan uk Jeon , Han shin Lee , Jae hyuck Choi , Seung wan Kim , Ik jun Kim , Jang dong You
CPC分类号： G03F1/142 , C25D11/024 , C25D11/026 , C25D11/04 , C25D11/06 , C25D11/18 , G03F1/64 , Y10T428/13 , Y10T428/1317
摘要： A pellicle frame, including aluminum, aluminum oxide, and a transition metal.
摘要翻译： 防护薄膜组件框架，包括铝，氧化铝和过渡金属。
-
4.发明授权公开(公告)号：US10087348B2
公开(公告)日：2018-10-02
申请号：US15254701
申请日：2016-09-01
发明人： Byungchul Yoo , Sungyong Cho , Jaehyuck Choi , Jeongsu Yang , Donghoon Chung , Han-Shin Lee , Myungjun Kim , Ikjun Kim , Jikang Kim , Jeonghwan Min , Kyoungchae Seo
IPC分类号： C08F8/44 , C08F220/06 , C09J133/10 , G03F1/64 , G03F1/82 , C09J133/08 , C09J133/06 , C08F6/02 , C09J133/02
摘要： A pellicle including a water-soluble adhesive and a photomask assembly including the pellicle are provided. A pellicle may include a membrane, a pellicle frame, and a water-soluble adhesive disposed on the pellicle frame. The water-soluble adhesive may be prepared by a mixture including a water-soluble acrylic adhesive material in an amount of about 40% to about 55% by weight of the mixture, water or a solution of water and alcohol in an amount of about 40% to about 55% by weight of the mixture, and an additive in an amount of about 1% to about 5% by weight of the mixture.
-
公开(公告)号：US20130202993A1
公开(公告)日：2013-08-08
申请号：US13827542
申请日：2013-03-14
发明人： Jung-jin KIM , Bum-hyun AN , Chan-uk JEON , Jang-dong YOU , Sung-wan KIM , Ik-jun KIM , Jae-hyuck CHOI , Han-shin LEE
IPC分类号： G03F1/00
CPC分类号： G03F1/142 , C25D11/024 , C25D11/026 , C25D11/04 , C25D11/06 , C25D11/18 , G03F1/64 , Y10T428/13 , Y10T428/1317
摘要： A pellicle frame, including aluminum, aluminum oxide, and a transition metal.
摘要翻译： 防护薄膜组件框架，包括铝，氧化铝和过渡金属。
-
公开(公告)号：US20240179833A1
公开(公告)日：2024-05-30
申请号：US18429427
申请日：2024-02-01
发明人： Jae Hwan KIM , Jae Won OH
CPC分类号： H05K1/0271 , H01J37/32733 , H05K1/0218 , H05K3/284 , H01J2237/2007 , H05K2201/068 , H05K2201/09036 , H05K2201/10151
摘要： A large area monitoring device for diagnosing easily performance of an equipment in a semiconductor process or a display process is disclosed. The monitoring device comprises a protection layer, a board disposed in an internal space of the protection layer, and at least one electrical element disposed on the board. Here, the electrical element includes one or more sensors, the monitoring device monitors an object to be monitored by measuring at least one of a temperature, a slope, a light, a vibration, a voltage, current, a power or a pressure of the object located outside the monitoring device and a distance between the object and another element, an intaglio structure or an embossing structure is formed to the board, material with different characteristics from the board is filled in the intaglio structure or the embossing structure is formed of material with different characteristics from the board.
-
公开(公告)号：US11790552B2
公开(公告)日：2023-10-17
申请号：US17476997
申请日：2021-09-16
申请人： FINE SEMITECH CORP.
发明人： Sung Chul Jeon , Dong Young Shin , Sun Woo Lee
CPC分类号： G06T7/62 , B05D5/10 , C09J5/00 , G01B11/0608 , G06T7/0004 , G06T2207/30108
摘要： An apparatus and method for applying a multi-component curable composition is disclosed. The method for applying a multi-component curable composition includes a) applying a plurality of fluids constituting the multi-component curable composition to a surface of a bonding target object layer by layer, b) acquiring a two-dimensional image of all the fluids applied layer by layer using an image sensor, c) measuring a height of all the fluids applied layer by layer using a distance sensor, and d) calculating a total volume of the multi-component curable composition by using the two-dimensional image and height of the fluids obtained in b) and c).
-
8.发明申请公开(公告)号：US20170088755A1
公开(公告)日：2017-03-30
申请号：US15254701
申请日：2016-09-01
发明人： Byungchul YOO , Sungyong CHO , Jaehyuck CHOI , Jeongsu Yang , Donghoon CHUNG , Han-Shin LEE , Myungjun KIM , Ikjun KIM , Jikang KIM , Jeonghwan MIN , Kyoungchae SEO
IPC分类号： C09J133/10 , G03F1/82 , B08B1/00 , C09J133/06 , B08B3/08 , B08B3/12 , G03F1/64 , C09J133/08
CPC分类号： C09J133/10 , C08F6/02 , C08F8/44 , C08F220/06 , C09J133/02 , C09J133/068 , C09J133/08 , C09J133/26 , G03F1/64 , G03F1/82
摘要： A pellicle including a water-soluble adhesive and a photomask assembly including the pellicle are provided. A pellicle may include a membrane, a pellicle frame, and a water-soluble adhesive disposed on the pellicle frame. The water-soluble adhesive may be prepared by a mixture including a water-soluble acrylic adhesive material in an amount of about 40% to about 55% by weight of the mixture, water or a solution of water and alcohol in an amount of about 40% to about 55% by weight of the mixture, and an additive in an amount of about 1% to about 5% by weight of the mixture.
-
9.发明申请PELLICLE FILM INCLUDING GRAPHITE-CONTAINING THIN FILM FOR EXTREME ULTRAVIOLET LITHOGRAPHY 有权薄膜包括用于极端超紫外光刻的含石墨的薄膜公开(公告)号：US20160282712A1
公开(公告)日：2016-09-29
申请号：US15034014
申请日：2014-06-03
申请人： SAMSUNG ELECTRONICS CO., LTD. , RESEARCH & BUSINESS FOUNDATION SUNGKYUNKWAN UNIVERSITY , FINE SEMITECH CORP.
发明人： Mun Ja KIM , Ji-beom YOO , Seul-gi KIM , Sang-jin CHO , Myung-shik CHANG , Jang-dong YOU
摘要： A pellicle film for extreme ultraviolet (EUV) lithography includes graphite-containing thin film.
摘要翻译： 用于极紫外（EUV）光刻的防护薄膜包括含石墨的薄膜。
-
公开(公告)号：US08779403B2
公开(公告)日：2014-07-15
申请号：US14103381
申请日：2013-12-11
发明人： Dong-Gun Lee , Eok-Bong Kim , Jong-Ju Park , Seong-Sue Kim
IPC分类号： G01J1/42
摘要： An apparatus and a method for generating extreme ultra violet radiation are provided. The apparatus for generating extreme ultra violet radiation includes a light source, a first reflecting mirror on which source light emitted from the light source is incident, a second reflecting mirror on which first reflected light reflected by the first reflecting mirror is incident, a focus mirror on which second reflected light reflected by the second reflecting mirror is incident, the focus mirror reflecting third reflected light back to the second reflecting mirror, and a gas cell on which fourth reflected light reflected by the second reflecting mirror is incident.
摘要翻译： 提供了一种用于产生极紫外辐射的装置和方法。 用于产生极紫外线辐射的装置包括光源，从光源发射的光源入射的第一反射镜，由第一反射镜反射的第一反射光入射的第二反射镜，聚焦反射镜 在第二反射镜反射的第二反射光入射到其上的情况下，将第三反射光反射回第二反射镜的聚焦镜和由第二反射镜反射的第四反射光入射的气室。
-
-
-
-
-
-
-
-
-
搜索结果
10 条记录 (耗时 0.011 秒)
