公开(公告)号：US08779403B2

公开(公告)日：2014-07-15

申请号：US14103381

申请日：2013-12-11

Applicant: Samsung Electronics Co., Ltd. ,  Fine Semitech Corp.

Inventor： Dong-Gun Lee ,  Eok-Bong Kim ,  Jong-Ju Park ,  Seong-Sue Kim

IPC: G01J1/42

CPC classification number: H05G2/008 ,  H05G2/003

Abstract: An apparatus and a method for generating extreme ultra violet radiation are provided. The apparatus for generating extreme ultra violet radiation includes a light source, a first reflecting mirror on which source light emitted from the light source is incident, a second reflecting mirror on which first reflected light reflected by the first reflecting mirror is incident, a focus mirror on which second reflected light reflected by the second reflecting mirror is incident, the focus mirror reflecting third reflected light back to the second reflecting mirror, and a gas cell on which fourth reflected light reflected by the second reflecting mirror is incident.

Abstract translation: 提供了一种用于产生极紫外辐射的装置和方法。 用于产生极紫外线辐射的装置包括光源，从光源发射的光源入射的第一反射镜，由第一反射镜反射的第一反射光入射的第二反射镜，聚焦反射镜 在第二反射镜反射的第二反射光入射到其上的情况下，将第三反射光反射回第二反射镜的聚焦镜和由第二反射镜反射的第四反射光入射的气室。

公开(公告)号：US10782254B2

公开(公告)日：2020-09-22

申请号：US16039647

申请日：2018-07-19

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Hyon-Seok Song ,  In-Yong Kang ,  Jong-Ju Park

IPC: G01N23/2251 ,  G06T7/00 ,  H01J37/28 ,  G03F1/86 ,  H01L21/67 ,  H01L21/66

Abstract: In a method of detecting a defect, a region of a substrate may be primarily scanned using a first electron beam to detect a first defect. A remaining region of the substrate, which may be defined by excluding a portion in which the first defect may be positioned from the region of the substrate, may be secondarily scanned using a second electron beam to detect a second defect. Thus, the portion with the defect may not be scanned in a following scan process so that a scanning time may be remarkably decreased.