Invention Grant
- Patent Title: Fluid control system and fluid control method
- Patent Title (中): 流体控制系统和流体控制方法
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Application No.: US13758498Application Date: 2013-02-04
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Publication No.: US08794261B2Publication Date: 2014-08-05
- Inventor: Masayuki Watanabe , Yoshiyuki Yamada , Shunsuke Umezawa
- Applicant: CKD Corporation
- Applicant Address: JP Komaki-shi
- Assignee: CKD Corporation
- Current Assignee: CKD Corporation
- Current Assignee Address: JP Komaki-shi
- Agency: Oliff PLC
- Priority: JP2012-076039 20120329; JP2013-002386 20130110
- Main IPC: F16K31/02
- IPC: F16K31/02

Abstract:
A fluid control system includes a vacuum chamber, a gas supply source to supply gas as a fluid, an exhaust pipe to discharge the fluid from the vacuum chamber, a gas supply pipe to connect the vacuum chamber to the gas supply source, and a pressure sensor to detect an internal pressure of the vacuum chamber. This system further includes a flowmeter placed between the gas supply source and the vacuum chamber, a proportional valve placed between the flowmeter and the vacuum chamber, a pressure controller to control the proportional valve based on output of the pressure sensor, a metering valve placed on the exhaust pipe, and a flow controller to control the metering valve based on an output of the flowmeter.
Public/Granted literature
- US20130255793A1 FLUID CONTROL SYSTEM AND FLUID CONTROL METHOD Public/Granted day:2013-10-03
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