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US08794267B2 Gas transport delay resolution for short etch recipes 有权
用于短蚀刻配方的气体输送延迟分辨率

Gas transport delay resolution for short etch recipes
Abstract:
In one embodiment, an apparatus for providing a gas mixture of a plurality of gases, may have a plurality of mass flow controllers (MFCs), a mixing manifold in fluid connection with each plurality of MFCs, a plurality of mixing manifold exits positioned on the mixing manifold; and an isolation device in fluid connection with each of the plurality of mixing manifold exits.
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