Invention Grant
- Patent Title: Gas transport delay resolution for short etch recipes
- Patent Title (中): 用于短蚀刻配方的气体输送延迟分辨率
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Application No.: US12810756Application Date: 2008-12-17
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Publication No.: US08794267B2Publication Date: 2014-08-05
- Inventor: Iqbal Shareef , Mark Taskar , Tony Zemlock
- Applicant: Iqbal Shareef , Mark Taskar , Tony Zemlock
- Applicant Address: US CA Fremont
- Assignee: Lam Research Corporation
- Current Assignee: Lam Research Corporation
- Current Assignee Address: US CA Fremont
- Agency: Beyer Law Group LLP
- International Application: PCT/US2008/087270 WO 20081217
- International Announcement: WO2009/085866 WO 20090709
- Main IPC: F16K11/10
- IPC: F16K11/10

Abstract:
In one embodiment, an apparatus for providing a gas mixture of a plurality of gases, may have a plurality of mass flow controllers (MFCs), a mixing manifold in fluid connection with each plurality of MFCs, a plurality of mixing manifold exits positioned on the mixing manifold; and an isolation device in fluid connection with each of the plurality of mixing manifold exits.
Public/Granted literature
- US20110005601A1 GAS TRANSPORT DELAY RESOLUTION FOR SHORT ETCH RECIPES Public/Granted day:2011-01-13
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