Invention Grant
- Patent Title: Hardmask
- Patent Title (中): 硬掩模
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Application No.: US13624946Application Date: 2012-09-23
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Publication No.: US08795774B2Publication Date: 2014-08-05
- Inventor: Deyan Wang , Jibin Sun , Peng-Wei Chuang , Peter Trefonas, III , Cong Liu
- Applicant: Rohm and Haas Electronic Materials LLC
- Applicant Address: US MA Marlborough
- Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee Address: US MA Marlborough
- Agent S. Matthew Cairns
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/038
Abstract:
Compositions containing certain organometallic oligomers suitable for use as spin-on, metal hardmasks are provided, where such compositions can be tailored to provide a metal oxide hardmask having a range of etch selectivity. Also provided are methods of depositing metal oxide hardmasks using the present compositions.
Public/Granted literature
- US20140087066A1 HARDMASK Public/Granted day:2014-03-27
Information query
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