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公开(公告)号：US09562169B2
公开(公告)日：2017-02-07
申请号：US14750180
申请日：2015-06-25
发明人： Deyan Wang , Jibin Sun , Peter Trefonas , Kathleen M. O'Connell
IPC分类号： H01L21/02 , C08K5/00 , C09D133/14 , H01L21/027 , H01L21/033
CPC分类号： C09D133/14 , C08K5/0091 , H01L21/02002 , H01L21/0271 , H01L21/0332
摘要： The invention provides a composition comprising at least the following A and B: A) a polymer comprising, in polymerized from, at least one “monomer that comprises at least one hydroxyl group;” and B) an organometal compound comprising at least one metal selected from Ti, Zr, Hf, Co, Mn, Zn, or combinations thereof, and wherein the organometal compound is present in an amount greater than 5 weight percent, based on the sum weight of A and B.
摘要翻译： 本发明提供了包含至少以下A和B的组合物：A）包含在至少一种“包含至少一个羟基的单体”的聚合物中的聚合物;和B）包含至少一种选自金属的金属的有机金属化合物 来自Ti，Zr，Hf，Co，Mn，Zn或其组合，其中基于A和B的总和重量，有机金属化合物以大于5重量％的量存在。
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公开(公告)号：US09070548B2
公开(公告)日：2015-06-30
申请号：US13776496
申请日：2013-02-25
发明人： Deyan Wang , Jibin Sun , Peter Trefonas , Kathleen M. O'connell
IPC分类号： H01L21/02 , C08K5/00 , H01L21/027 , H01L21/033
CPC分类号： C09D133/14 , C08K5/0091 , H01L21/02002 , H01L21/0271 , H01L21/0332
摘要： The invention provides a composition comprising at least the following A and B: A) a polymer comprising, in polymerized from, at least one “monomer that comprises at least one hydroxyl group;” and B) an organometal compound comprising at least one metal selected from Ti, Zr, Hf, Co, Mn, Zn, or combinations thereof, and wherein the organometal compound is present in an amount greater than 5 weight percent, based on the sum weight of A and B.
摘要翻译： 本发明提供了包含至少以下A和B的组合物：A）包含在至少一种“包含至少一个羟基的单体”的聚合物中的聚合物;和B）包含至少一种选自金属的金属的有机金属化合物 来自Ti，Zr，Hf，Co，Mn，Zn或其组合，其中基于A和B的总和重量，有机金属化合物以大于5重量％的量存在。
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公开(公告)号：US09490117B2
公开(公告)日：2016-11-08
申请号：US14588410
申请日：2014-12-31
发明人： Jong Keun Park , Jibin Sun , Christopher D. Gilmore , Jieqian Zhang , Phillip D. Hustad , Peter Trefonas, III , Kathleen M. O'Connell
IPC分类号： G03F7/004 , H01L21/02 , H01L21/027 , G03F7/00 , G03F7/20 , G03F7/38 , G03F7/40 , C08F220/18 , C08F12/32 , C08F212/32 , C08F212/08 , H01L21/311 , C08F220/30
CPC分类号： H01L21/02255 , C08F12/32 , C08F212/08 , C08F212/12 , C08F212/32 , C08F220/18 , C08F2220/302 , C09D125/08 , C09D125/16 , G03F7/00 , G03F7/0002 , G03F7/004 , G03F7/20 , G03F7/38 , G03F7/40 , H01L21/02118 , H01L21/02282 , H01L21/0274 , H01L21/311 , C08F2220/301
摘要： A method of forming a pattern by directed self-assembly, comprising: (a) providing a semiconductor substrate comprising one or more layers to be patterned; (b) applying a crosslinkable underlayer composition over the one or more layers to be patterned to form a crosslinkable underlayer, wherein the crosslinkable underlayer composition comprises a crosslinkable polymer comprising a first unit formed from a monomer of the following general formula (I-A) or (I-B): wherein: P is a polymerizable functional group; L is a single bond or an m+1-valent linking group; X1 is a monovalent electron donating group; X2 is a divalent electron donating group; Ar1 and Ar2 are trivalent and divalent aryl groups, respectively, and carbon atoms of the cyclobutene ring are bonded to adjacent carbon atoms on the same aromatic ring of Ar1 or Ar2; m and n are each an integer of 1 or more; and each R1 is independently a monovalent group; (c) heating the crosslinkable underlayer to form a crosslinked underlayer; (d) forming a self-assembling layer comprising a block copolymer over the crosslinked underlayer; and (e) annealing the self-assembling layer. The methods and compositions find particular applicability in the manufacture of semiconductor devices or data storage devices for the formation of high resolution patterns.
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4.发明授权Dendritic compounds, photoresist compositions and methods of making electronic devices 有权树枝状化合物，光致抗蚀剂组合物和制造电子器件的方法公开(公告)号：US09128372B2
公开(公告)日：2015-09-08
申请号：US14145551
申请日：2013-12-31
发明人： Emad Aqad , Cheng-Bai Xu , Irvinder Kaur , Mingqi Li , Jibin Sun , Cecily Andes
IPC分类号： G03F7/004 , G03F7/20 , C07C309/00 , C07C69/74 , C07C303/32
CPC分类号： G03F7/004 , C07C303/32 , C07C2603/26 , G03F7/0042 , G03F7/038 , G03F7/039 , G03F7/20
摘要： Dendritic compounds are provided. The dendritic compounds include an anionic dendron that has a focal point having an anionic group and a linking group, and a photoreactive cation. The dendritic compounds find particular use as photoacid generators. Also provided are photoresist compositions that include such a dendritic compound, as well as methods of forming electronic devices with the photoresist compositions. The dendritic compounds, photoresist compositions and methods find particular applicability in the manufacture of semiconductor devices.
摘要翻译： 提供树枝状化合物。 树枝状化合物包括具有阴离子基团和连接基团的焦点的阴离子树突，以及光反应性阳离子。 树枝状化合物特别用作光致酸发生剂。 还提供了包括这种树枝状化合物的光致抗蚀剂组合物，以及用光致抗蚀剂组合物形成电子器件的方法。 树枝状化合物，光致抗蚀剂组合物和方法在半导体器件的制造中特别适用。
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公开(公告)号：US08795774B2
公开(公告)日：2014-08-05
申请号：US13624946
申请日：2012-09-23
发明人： Deyan Wang , Jibin Sun , Peng-Wei Chuang , Peter Trefonas, III , Cong Liu
CPC分类号： C08F220/10 , C08F220/18 , G03F7/091 , G03F7/094
摘要： Compositions containing certain organometallic oligomers suitable for use as spin-on, metal hardmasks are provided, where such compositions can be tailored to provide a metal oxide hardmask having a range of etch selectivity. Also provided are methods of depositing metal oxide hardmasks using the present compositions.
摘要翻译： 提供了包含适合用作旋涂金属硬掩模的某些有机金属低聚物的组合物，其中可以调整这些组合物以提供具有一定范围的蚀刻选择性的金属氧化物硬掩模。 还提供了使用本发明组合物沉积金属氧化物硬掩模的方法。
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公开(公告)号：US20150291829A1
公开(公告)日：2015-10-15
申请号：US14750180
申请日：2015-06-25
发明人： Deyan Wang , Jibin Sun , Peter Trefonas , Kathleen M. O'Connell
IPC分类号： C09D133/14
CPC分类号： C09D133/14 , C08K5/0091 , H01L21/02002 , H01L21/0271 , H01L21/0332
摘要： The invention provides a composition comprising at least the following A and B: A) a polymer comprising, in polymerized from, at least one “monomer that comprises at least one hydroxyl group;” and B) an organometal compound comprising at least one metal selected from Ti, Zr, Hf, Co, Mn, Zn, or combinations thereof, and wherein the organometal compound is present in an amount greater than 5 weight percent, based on the sum weight of A and B.
摘要翻译： 本发明提供了包含至少以下A和B的组合物：A）包含在至少一种“包含至少一个羟基的单体”的聚合物中的聚合物;和B）包含至少一种选自金属的金属的有机金属化合物 来自Ti，Zr，Hf，Co，Mn，Zn或其组合，其中基于A和B的总和重量，有机金属化合物以大于5重量％的量存在。
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公开(公告)号：US20180224741A1
公开(公告)日：2018-08-09
申请号：US15747897
申请日：2016-07-11
IPC分类号： G03F7/00 , G03F7/004 , G03F7/037 , G03F7/16 , G03F7/20 , G03F7/32 , G03F7/40 , H01L27/32 , H01L51/56 , H01L51/52 , C08F220/18 , C09D133/08 , C08G61/12 , C09D165/00
CPC分类号： G03F7/0007 , C08F220/18 , C08F2800/20 , C08G61/124 , C08G2261/124 , C08G2261/1412 , C08G2261/1422 , C08G2261/1426 , C08G2261/148 , C08G2261/228 , C08G2261/3221 , C08G2261/3324 , C08G2261/3327 , C08G2261/95 , C09D133/08 , C09D165/00 , G03F7/0044 , G03F7/0226 , G03F7/0233 , G03F7/037 , G03F7/162 , G03F7/168 , G03F7/2004 , G03F7/327 , G03F7/40 , H01L27/3246 , H01L51/5221 , H01L51/56
摘要： A photoimageable composition for preparing a polymeric binder having of one or more of monomer unit copolymers, a photoactive compound, and one or more organometallic compounds is provided. The copolymers include one or more hydroxyl or carboxyl functional groups that react with the organometallic compound to form a crosslinked network upon curing. The photoimageable compositions may be particularly useful in forming a pixel-defining layer of an electronic device. such as an organic light emitting diode. In particular, photoimageable compositions in accordance with embodiments of the present invention are insoluble in the developer prior to exposure to radiation, soluble in the developer following radiation exposure, and have relatively high glass transition temperatures (Tg) making them useful in forming a pixel-defining layer.
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公开(公告)号：US20130337179A1
公开(公告)日：2013-12-19
申请号：US13776496
申请日：2013-02-25
发明人： Deyan Wang , Jibin Sun , Peter Trefonas , Kathleen M. O'Connell
IPC分类号： H01L21/02 , H01L21/027 , C08K5/00
CPC分类号： C09D133/14 , C08K5/0091 , H01L21/02002 , H01L21/0271 , H01L21/0332
摘要： The invention provides a composition comprising at least the following A and B: A) a polymer comprising, in polymerized from, at least one “monomer that comprises at least one hydroxyl group;” and B) an organometal compound comprising at least one metal selected from Ti, Zr, Hf, Co, Mn, Zn, or combinations thereof, and wherein the organometal compound is present in an amount greater than 5 weight percent, based on the sum weight of A and B.
摘要翻译： 本发明提供包含至少以下A和B的组合物：A）聚合物，其包含在至少一种“包含至少一个羟基的单体”的聚合物中; 和B）包含至少一种选自Ti，Zr，Hf，Co，Mn，Zn或其组合的金属的有机金属化合物，其中所述有机金属化合物以大于5重量％的量存在，基于总重量 的A和B
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