Invention Grant
- Patent Title: (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it
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Application No.: US13687959Application Date: 2012-11-28
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Publication No.: US08802783B2Publication Date: 2014-08-12
- Inventor: Katsumi Maeda , Shigeyuki Iwasa , Kaichiro Nakano , Etsuo Hasegawa
- Applicant: NEC Corporation
- Applicant Address: JP Tokyo
- Assignee: NEC Corporation
- Current Assignee: NEC Corporation
- Current Assignee Address: JP Tokyo
- Agency: Foley & Lardner LLP
- Priority: JP10-188853 19980703; JP10-328491 19981118
- Main IPC: C08F34/02
- IPC: C08F34/02 ; C08F134/02 ; C08F234/02 ; C08F8/00 ; C08F2/00 ; C08F118/02 ; C08F32/08 ; G03F7/004 ; G03F7/038 ; C08F120/28 ; C08F20/28 ; C07D307/93 ; G03F7/039
Abstract:
A photoresist material comprising a polymer with at least two acrylate derivatives incorporated therein, and a photo-acid generator for generating an acid by exposure, wherein at least one of the two acrylate derivatives incorporated therein comprises a norbornyl moiety having a lactone structure, and at least one of the two acrylate derivatives comprises an ester-substituted tetracyclododecyl moiety.
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