公开(公告)号：US20140057167A1

公开(公告)日：2014-02-27

申请号：US14068332

申请日：2013-10-31

Applicant: NEC CORPORATION ,  DIC CORPORATION

Inventor： Masanori KASAI ,  Hiroshi Isozumi ,  Takayoshi Obata ,  Shigeyuki Iwasa ,  Kentaro Nakahara ,  Masahiro Suguro

IPC: H01M4/62

CPC classification number: H01M4/625 ,  H01M4/136 ,  H01M4/60 ,  H01M4/606

Abstract: A secondary battery using a polymer radical material and a conducting additive in which the performance of a conductive auxiliary layer is further improved and the internal resistance is reduced, thereby achieving a higher output. Specifically disclosed is a secondary battery in which at least one of a positive electrode and a negative electrode uses, as an electrode active material, a polymer radical material and a conducting additive having electrical conductivity. By providing a conductive auxiliary layer between a current collector and the polymer radical material/conducting additive electrode which is mainly composed of graphite, fibrous carbon or a granular carbon having a DBP absorption of not more than 110 cm3/100 g, the secondary battery with a higher output can be obtained.

Abstract translation: 使用聚合物自由基材料的二次电池和导电性辅助层的性能进一步提高并且内部电阻降低的导电性添加剂，从而实现更高的输出。 具体公开了其中正电极和负电极中的至少一个使用具有导电性的聚合物自由基材料和导电添加剂作为电极活性材料的二次电池。 通过在集电体和主要由石墨，纤维状碳或DBP吸收不超过11​​0cm 3 / 100g的颗粒状碳组成的聚合物自由基材料/导电添加电极之间设置导电辅助层，将二次电池与 可以获得更高的输出。

公开(公告)号：US20230096785A1

公开(公告)日：2023-03-30

申请号：US17794840

申请日：2021-01-25

Applicant: NEC Corporation

Inventor： Katsumi Maeda ,  Shigeyuki Iwasa

IPC: G01N27/48 ,  G01N21/64

Abstract: Disease infection in a plant can be detected at an early stage by utilizing a boron-oxygen compound having a specific structure that selectively recognizes and forms a complex with methyl salicylate, which is a plant hormone released when a plant is infected by a pathogen, as a receptor for sensing, and by utilizing a fluorescence emission phenomenon and a change in electrochemical behavior after the reaction with methyl salicylate.

公开(公告)号：US08802783B2

公开(公告)日：2014-08-12

申请号：US13687959

申请日：2012-11-28

Applicant: NEC Corporation

Inventor： Katsumi Maeda ,  Shigeyuki Iwasa ,  Kaichiro Nakano ,  Etsuo Hasegawa

IPC: C08F34/02 ,  C08F134/02 ,  C08F234/02 ,  C08F8/00 ,  C08F2/00 ,  C08F118/02 ,  C08F32/08 ,  G03F7/004 ,  G03F7/038 ,  C08F120/28 ,  C08F20/28 ,  C07D307/93 ,  G03F7/039

Abstract: A photoresist material comprising a polymer with at least two acrylate derivatives incorporated therein, and a photo-acid generator for generating an acid by exposure, wherein at least one of the two acrylate derivatives incorporated therein comprises a norbornyl moiety having a lactone structure, and at least one of the two acrylate derivatives comprises an ester-substituted tetracyclododecyl moiety.

公开(公告)号：US20130122419A1

公开(公告)日：2013-05-16

申请号：US13687959

申请日：2012-11-28

Applicant: NEC Corporation

Inventor： Katsumi MAEDA ,  Shigeyuki Iwasa ,  Kaichiro Nakano ,  Etsuo Hasegawa

IPC: G03F7/004

CPC classification number: C08F222/14 ,  C07D307/93 ,  C08F20/28 ,  C08F120/28 ,  C08F220/32 ,  G03F7/004 ,  G03F7/0045 ,  G03F7/038 ,  G03F7/0382 ,  G03F7/039 ,  Y10S430/111

Abstract: A photoresist material for lithography using a light of 220 nm or less which comprises at least a polymer represented by the following formula (2) and a photo-acid generator for generating an acid by exposure: wherein R1, R2, R3 and R5 are each a hydrogen atom or a methyl group; R4 is an acid-labile group or one of a specified subset of alicyclic hydrocarbon groups, alicyclic hydrocarbon groups, or hydrocarbon groups; R6 is a hydrogen atom or one of a specified subset of hydrocarbon groups or alicyclic hydrocarbon groups; x, y and z are optional values which meet x+y+z=1, 0

Abstract translation: 一种用于光刻的光致抗蚀剂材料，其使用220nm以下的光，其至少包含由下式（2）表示的聚合物和通过曝光产生酸的光酸发生剂：其中R1，R2，R3和R5各自 氢原子或甲基; R4是酸不稳定基团或脂环族烃基，脂环族烃基或烃基的特定子集之一; R6是氢原子或烃基或脂环烃基的特定子集之一; x，y和z是满足x + y + z = 1,0

公开(公告)号：US08969483B2

公开(公告)日：2015-03-03

申请号：US13687959

申请日：2012-11-28

Applicant: NEC Corporation

Inventor： Katsumi Maeda ,  Shigeyuki Iwasa ,  Kaichiro Nakano ,  Etsuo Hasegawa

IPC: C08F34/02 ,  C08F134/02 ,  C08F234/02 ,  C08F8/00 ,  C08F2/00 ,  C08F118/02 ,  C08F32/08 ,  G03F7/004 ,  G03F7/038 ,  C08F120/28 ,  C08F20/28 ,  C07D307/93 ,  G03F7/039

CPC classification number: C08F222/14 ,  C07D307/93 ,  C08F20/28 ,  C08F120/28 ,  C08F220/32 ,  G03F7/004 ,  G03F7/0045 ,  G03F7/038 ,  G03F7/0382 ,  G03F7/039 ,  Y10S430/111

Abstract: A photoresist material comprising a polymer with at least two acrylate derivatives incorporated therein, and a photo-acid generator for generating an acid by exposure, wherein at least one of the two acrylate derivatives incorporated therein comprises a norbornyl moiety having a lactone structure, and at least one of the two acrylate derivatives comprises an ester-substituted tetracyclododecyl moiety.

Abstract translation: 包含掺入其中的至少两种丙烯酸酯衍生物的聚合物的光致抗蚀剂材料和通过暴露产生酸的光酸发生剂，其中并入其中的两种丙烯酸酯衍生物中的至少一种包含具有内酯结构的降冰片基部分， 两种丙烯酸酯衍生物中的至少一种包含酯取代的四环十二烷基部分。