发明授权
US08821640B2 Solid precursor-based delivery of fluid utilizing controlled solids morphology
有权
使用受控固体形态的基于固体前体的流体输送
- 专利标题: Solid precursor-based delivery of fluid utilizing controlled solids morphology
- 专利标题(中): 使用受控固体形态的基于固体前体的流体输送
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申请号: US12438502申请日: 2007-08-31
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公开(公告)号: US08821640B2公开(公告)日: 2014-09-02
- 发明人: John M. Cleary , Jose I. Arno , Bryan C. Hendrix , Donn Naito , Scott Battle , John N. Gregg , Michael J. Wodjenski , Chongying Xu
- 申请人: John M. Cleary , Jose I. Arno , Bryan C. Hendrix , Donn Naito , Scott Battle , John N. Gregg , Michael J. Wodjenski , Chongying Xu
- 申请人地址: US CT Danbury
- 专利权人: Advanced Technology Materials, Inc.
- 当前专利权人: Advanced Technology Materials, Inc.
- 当前专利权人地址: US CT Danbury
- 代理机构: Hultquist, PLLC
- 代理商 Steven J. Hultquist; Maggie Chappuis
- 国际申请: PCT/US2007/077466 WO 20070831
- 国际公布: WO2008/028170 WO 20080306
- 主分类号: C23C16/54
- IPC分类号: C23C16/54 ; C23C16/44 ; C23C16/00 ; C23C16/448
摘要:
Apparatus and method for volatilizing a source reagent susceptible to particle generation or presence of particles in the corresponding source reagent vapor, in which such particle generation or presence is suppressed by structural or processing features of the vapor generation system. Such apparatus and method are applicable to liquid and solid source reagents, particularly solid source reagents such as metal halides, e.g., hafnium chloride. The source reagent in one specific implementation is constituted by a porous monolithic bulk form of the source reagent material. The apparatus and method of the invention are usefully employed to provide source reagent vapor for applications such as atomic layer deposition (ALD) and ion implantation.