发明授权
- 专利标题： Dry non-plasma treatment system and method of using
- 专利标题（中）： 干式非等离子体处理系统及其使用方法
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申请号： US12772232申请日： 2010-05-02
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公开(公告)号： US08828185B2公开(公告)日： 2014-09-09
- 发明人: Martin Kent , Eric J. Strang
- 申请人： Martin Kent , Eric J. Strang
- 申请人地址： JP Tokyo
- 专利权人： Tokyo Electron Limited
- 当前专利权人： Tokyo Electron Limited
- 当前专利权人地址： JP Tokyo
- 主分类号： C23F1/00
- IPC分类号： C23F1/00
摘要：
A dry non-plasma treatment system and method for removing oxide material is described. The treatment system is configured to provide chemical treatment of one or more substrates, wherein each substrate is exposed to a gaseous chemistry under controlled conditions including surface temperature and gas pressure. Furthermore, the treatment system is configured to provide thermal treatment of each substrate, wherein each substrate is thermally treated to remove the chemically treated surfaces on each substrate.
公开/授权文献
- US20100237046A1 DRY NON-PLASMA TREATMENT SYSTEM AND METHOD OF USING 公开/授权日：2010-09-23
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