Invention Grant
- Patent Title: Self-alignment due to wettability difference of an interface
- Patent Title (中): 由于界面的润湿性差,自对准
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Application No.: US13751540Application Date: 2013-01-28
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Publication No.: US08828484B2Publication Date: 2014-09-09
- Inventor: Jay Lai , Ying-Hao Kuo , Hai-Ching Chen , Tien-I Bao
- Applicant: Taiwan Semiconductor Manufacturing Co. Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Eschweiler & Associates, LLC
- Main IPC: B05D5/06
- IPC: B05D5/06

Abstract:
Some embodiments relate to a method of processing a workpiece. The workpiece includes a first surface region having a first wettability coefficient, and a second surface region having a second wettability coefficient that differs from the first wettability coefficient. A liquid, which corresponds to an optical structure, is dispensed on the first and second surface regions of the workpiece, wherein the liquid self-aligns to the second surface region due to the difference between the first and second wettability coefficients. The self-aligned liquid is hardened to form the optical structure.
Public/Granted literature
- US20140212627A1 SELF-ALIGNMENT DUE TO WETTABILITY DIFFERENCE OF AN INTERFACE Public/Granted day:2014-07-31
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