发明授权
US08828642B2 Positive photosensitive resin composition, cured film obtained using same, and optical device
有权
正型感光性树脂组合物，使用其获得的固化膜和光学装置
- 专利标题： Positive photosensitive resin composition, cured film obtained using same, and optical device
- 专利标题（中）： 正型感光性树脂组合物，使用其获得的固化膜和光学装置
-
申请号： US13496717申请日： 2010-09-16
-
公开(公告)号： US08828642B2公开(公告)日： 2014-09-09
- 发明人: Masao Kamogawa , Toru Okazawa , Mitsuhito Suwa
- 申请人： Masao Kamogawa , Toru Okazawa , Mitsuhito Suwa
- 申请人地址： JP Tokyo
- 专利权人： Toray Industries, Inc.
- 当前专利权人： Toray Industries, Inc.
- 当前专利权人地址： JP Tokyo
- 代理机构： Birch, Stewart, Kolasch & Birch, LLP
- 优先权： JP2009-223904 20090929
- 国际申请： PCT/JP2010/066021 WO 20100916
- 国际公布： WO2011/040248 WO 20110407
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/075 ; G03F7/40
摘要：
Disclosed is a positive photosensitive resin composition which is characterized by containing (a) a polysiloxane that is synthesized by hydrolyzing and partially condensing a specific organosilane and an organosilane oligomer, (b) aluminum compound particles, tin compound particles, titanium compound particles, zirconium compound particles, composite particles of the aforementioned compounds or composite particles of any of the aforementioned compounds and a silicon compound, (c) a naphthoquinonediazide compound and (d) a solvent. The positive photosensitive resin composition is also characterized in that the organosilane oligomer contains a specific organosilane. The positive photosensitive resin composition has achieved excellent sensitivity and resolution without deteriorating high refractive index and high transparency.
公开/授权文献
信息查询
IPC分类:
