发明授权
- 专利标题: Positive-type photosensitive resin composition and cured film manufactured therefrom
- 专利标题(中): 正型感光性树脂组合物及其制造的固化膜
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申请号: US11491156申请日: 2006-07-24
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公开(公告)号: US08828651B2公开(公告)日: 2014-09-09
- 发明人: Tadashi Hatanaka
- 申请人: Tadashi Hatanaka
- 申请人地址: JP Tokyo
- 专利权人: Nissan Chemical Industries, Ltd.
- 当前专利权人: Nissan Chemical Industries, Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Oliff PLC
- 优先权: JP2005-214589 20050725; JP2005-364886 20051219; JP2006-010383 20060118; JP2006-146893 20060526
- 主分类号: G03F7/039
- IPC分类号: G03F7/039 ; G03F7/027 ; G03F7/26 ; G03F7/16 ; G03F7/20
摘要:
A positive-type photosensitive resin composition comprising component (A): an alkali-soluble resin having a functional group which undergoes heat crosslinking reaction with a compound of component (B), a functional group for film curing which undergoes thermoset reaction with a compound of component (C), and a number average molecular weight of 2,000 to 30,000; component (B): a compound having two or more vinyl ether groups per molecule; component (C): a compound having two or more blocked isocyanate groups per molecule; component (D): a photoacid generator; and component (E): a solvent. A production process of the positive-type photosensitive resin composition comprising mixing the above-mentioned components and maintaining the mixture at a temperature higher than room temperature. A cured film manufactured by using the positive-type photosensitive resin composition. The composition has a high sensitivity and little film reduction of unexposed part, maintains a high transmittance even after baking at a high temperature or resist stripping treatment, and cause no reduction of film thickness. Therefore, the composition provides a cured film suited as a film material for several displays.
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