发明授权
- 专利标题： Dosimetry implant for treating restenosis and hyperplasia
- 专利标题（中）： 用于治疗再狭窄和增生的剂量测量植入物
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申请号： US11758937申请日： 2007-06-06
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公开(公告)号： US08834338B2公开(公告)日： 2014-09-16
- 发明人: Suresh Srivastava , Gilbert R. Gonzales , Roger W. Howell , Wesley E. Bolch , Radoslav Adzic
- 申请人： Suresh Srivastava , Gilbert R. Gonzales , Roger W. Howell , Wesley E. Bolch , Radoslav Adzic
- 申请人地址： US TX The Woodlands
- 专利权人： SnIP Holdings, Inc.
- 当前专利权人： SnIP Holdings, Inc.
- 当前专利权人地址： US TX The Woodlands
- 代理机构： Wood Herron & Evans LLP
- 主分类号： A61N5/00
- IPC分类号： A61N5/00 ; A61F2/91 ; A61N5/10
摘要：
The present invention discloses a method of selectively providing radiation dosimetry to a subject in need of such treatment. The radiation is applied by an implant comprising a body member and 117mSn electroplated at selected locations of the body member, emitting conversion electrons absorbed immediately adjacent selected locations while not affecting surrounding tissue outside of the immediately adjacent area.
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