Invention Grant
- Patent Title: High efficiency thin film transistor device with gallium arsenide layer
- Patent Title (中): 具有砷化镓层的高效薄膜晶体管器件
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Application No.: US13250748Application Date: 2011-09-30
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Publication No.: US08846437B2Publication Date: 2014-09-30
- Inventor: Kaushal K. Singh , Robert Jan Visser , Srikant Rao , Bhaskar Kumar , Claire J. Carmalt , Ranga Rao Arnepalli , Omkaram Nalamasu , Gaurav Saraf , Sanjayan Sathasivam , Christopher Stuart Blackman
- Applicant: Kaushal K. Singh , Robert Jan Visser , Srikant Rao , Bhaskar Kumar , Claire J. Carmalt , Ranga Rao Arnepalli , Omkaram Nalamasu , Gaurav Saraf , Sanjayan Sathasivam , Christopher Stuart Blackman
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson & Sheridan, LLP
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L21/02 ; B82Y30/00 ; H01L31/18 ; H01L31/072 ; H01L31/0352 ; H01L51/42 ; C23C16/56 ; H01L31/075 ; H01L31/0224 ; C23C16/30 ; H01L51/00

Abstract:
Embodiments of the invention provide a method of forming a doped gallium arsenide based (GaAs) layer from a solution based precursor. The doped gallium arsenide based (GaAs) layer formed from the solution based precursor may assist solar cell devices to improve light absorption and conversion efficiency. In one embodiment, a method of forming a solar cell device includes forming a first layer with a first type of dopants doped therein over a surface of a substrate, forming a GaAs based layer on the first layer, and forming a second layer with a second type of dopants doped therein on the GaAs based layer.
Public/Granted literature
- US20120080092A1 HIGH EFFICIENCY SOLAR CELL DEVICE WITH GALLIUM ARSENIDE ABSORBER LAYER Public/Granted day:2012-04-05
Information query
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