Invention Grant
- Patent Title: Shared gas panels in plasma processing systems
- Patent Title (中): 等离子处理系统中的共用气体面板
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Application No.: US13431946Application Date: 2012-03-27
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Publication No.: US08851113B2Publication Date: 2014-10-07
- Inventor: Mark Taskar , Iqbal Shareef
- Applicant: Mark Taskar , Iqbal Shareef
- Applicant Address: US CA Fremont
- Assignee: Lam Research Coporation
- Current Assignee: Lam Research Coporation
- Current Assignee Address: US CA Fremont
- Main IPC: F16K11/20
- IPC: F16K11/20

Abstract:
Methods and apparatus for shared gas panel for supplying a process gas to a plurality of process modules are disclosed. The shared gas panel includes a plurality of mixing valves and at least two mixing manifolds for a given mixing valve to service at least two process modules. The mixing manifolds are disposed on a given plane and staggered to save space. Components of the shared gas panel are also stacked vertically in order to reduce volume of the shared gas panel enclosure. Components are optimized such that the two mixing manifolds coupled to the given mixing valve receive equal mass flow to eliminate matching issues.
Public/Granted literature
- US20130255781A1 SHARED GAS PANELS IN PLASMA PROCESSING SYSTEMS Public/Granted day:2013-10-03
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