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25 条记录 (耗时 0.015 秒)

    System and method for decreasing scrubber exhaust from gas delivery panels
    1.
    发明授权
    System and method for decreasing scrubber exhaust from gas delivery panels 有权
    从气体输送板减少洗涤器排气的系统和方法

    公开(公告)号：US09175808B2

    公开(公告)日：2015-11-03

    申请号：US13220890

    申请日：2011-08-30

    申请人： Mark Taskar ,  Iqbal Shareef

    发明人： Mark Taskar ,  Iqbal Shareef

    IPC分类号： B60B15/04 ,  F17D1/00 ,  B08B15/00 ,  B08B15/04

    CPC分类号： F17D1/00 ,  B08B15/002 ,  B08B15/04 ,  F17C1/00 ,  F17C2221/031 ,  G01M3/22 ,  Y10T137/0318 ,  Y10T137/6851 ,  Y10T137/7736 ,  Y10T137/7761 ,  Y10T137/86107

    摘要： A method and apparatus is provided for decreasing the scrubber exhaust from gas panels, lower the cost of operation, lower the facilitation cost and power consumption by increasing the air velocity in areas of high potential risk of ignition. The apparatus includes a supply of compressed dry air (CDA) through the tubing with individual dispersion nozzles. The CDA dispersion nozzles can be installed at various key locations in order to provide additional ventilation turbulence and reduce potential dead zones inside the gas panel. Aspects of the invention help to save the energy and protect the environment by reducing the power consumption. In addition human safety shall be improved by minimizing the potential risk of ignition.

    摘要翻译： 提供一种方法和装置，用于减少来自气体面板的洗涤器排气，降低操作成本，通过在高潜在的点火风险区域中增加空气速度来降低便利成本和功率消耗。 该设备包括通过具有各个分散喷嘴的管道供应压缩干燥空气（CDA）。 CDA分散喷嘴可以安装在各种关键位置，以便提供额外的通风湍流并减少气体面板内的潜在死区。 本发明的方面有助于通过降低功耗来节省能源和保护环境。 另外，通过最小化潜在的点火风险，可以改善人身安全。

    SHARED GAS PANELS IN PLASMA PROCESSING SYSTEMS
    4.
    发明申请
    SHARED GAS PANELS IN PLASMA PROCESSING SYSTEMS 有权
    等离子体加工系统中的共用气体面板

    公开(公告)号：US20130255781A1

    公开(公告)日：2013-10-03

    申请号：US13431946

    申请日：2012-03-27

    申请人： Mark Taskar ,  Iqbal Shareef

    发明人： Mark Taskar ,  Iqbal Shareef

    IPC分类号： B01F5/04

    CPC分类号： B01F3/026 ,  Y10T137/0318 ,  Y10T137/87249 ,  Y10T137/87281 ,  Y10T137/87652 ,  Y10T137/87885

    摘要： Methods and apparatus for shared gas panel for supplying a process gas to a plurality of process modules are disclosed. The shared gas panel includes a plurality of mixing valves and at least two mixing manifolds for a given mixing valve to service at least two process modules. The mixing manifolds are disposed on a given plane and staggered to save space. Components of the shared gas panel are also stacked vertically in order to reduce volume of the shared gas panel enclosure. Components are optimized such that the two mixing manifolds coupled to the given mixing valve receive equal mass flow to eliminate matching issues.

    摘要翻译： 公开了用于向多个处理模块提供处理气体的共用气体面板的方法和装置。 共用气体面板包括多个混合阀和用于给定混合阀的至少两个混合歧管，以用于至少两个过程模块。 混合歧管布置在给定的平面上并交错以节省空间。 共用气体面板的组件也垂直堆叠，以减少共用气体面板外壳的体积。 优化组件使得耦合到给定混合阀的两个混合歧管获得相等的质量流量以消除匹配问题。

    Shared gas panels in plasma processing systems
    6.
    发明授权
    Shared gas panels in plasma processing systems 有权
    等离子处理系统中的共用气体面板

    公开(公告)号：US08851113B2

    公开(公告)日：2014-10-07

    申请号：US13431946

    申请日：2012-03-27

    申请人： Mark Taskar ,  Iqbal Shareef

    发明人： Mark Taskar ,  Iqbal Shareef

    IPC分类号： F16K11/20

    CPC分类号： B01F3/026 ,  Y10T137/0318 ,  Y10T137/87249 ,  Y10T137/87281 ,  Y10T137/87652 ,  Y10T137/87885

    摘要： Methods and apparatus for shared gas panel for supplying a process gas to a plurality of process modules are disclosed. The shared gas panel includes a plurality of mixing valves and at least two mixing manifolds for a given mixing valve to service at least two process modules. The mixing manifolds are disposed on a given plane and staggered to save space. Components of the shared gas panel are also stacked vertically in order to reduce volume of the shared gas panel enclosure. Components are optimized such that the two mixing manifolds coupled to the given mixing valve receive equal mass flow to eliminate matching issues.

    摘要翻译： 公开了用于向多个处理模块提供处理气体的共用气体面板的方法和装置。 共用气体面板包括多个混合阀和用于给定混合阀的至少两个混合歧管，以用于至少两个过程模块。 混合歧管布置在给定的平面上并交错以节省空间。 共用气体面板的组件也垂直堆叠，以减少共用气体面板外壳的体积。 优化组件使得耦合到给定混合阀的两个混合歧管获得相等的质量流量以消除匹配问题。

    Gas transport delay resolution for short etch recipes
    7.
    发明授权
    Gas transport delay resolution for short etch recipes 有权
    用于短蚀刻配方的气体输送延迟分辨率

    公开(公告)号：US08794267B2

    公开(公告)日：2014-08-05

    申请号：US12810756

    申请日：2008-12-17

    申请人： Iqbal Shareef ,  Mark Taskar ,  Tony Zemlock

    发明人： Iqbal Shareef ,  Mark Taskar ,  Tony Zemlock

    IPC分类号： F16K11/10

    CPC分类号： H01L21/67069 ,  H01L21/67253 ,  Y10T137/0318 ,  Y10T137/877 ,  Y10T137/87885

    摘要： In one embodiment, an apparatus for providing a gas mixture of a plurality of gases, may have a plurality of mass flow controllers (MFCs), a mixing manifold in fluid connection with each plurality of MFCs, a plurality of mixing manifold exits positioned on the mixing manifold; and an isolation device in fluid connection with each of the plurality of mixing manifold exits.

    摘要翻译： 在一个实施例中，用于提供多种气体的气体混合物的设备可以具有多个质量流量控制器（MFC），与每个多个MFC流体连接的混合歧管，多个混合歧管出口位于 混合歧管 以及与多个混合歧管出口中的每一个流体连接的隔离装置。

    SYSTEM AND METHOD FOR DECREASING SCRUBBER EXHAUST FROM GAS DELIVERY PANELS
    8.
    发明申请
    SYSTEM AND METHOD FOR DECREASING SCRUBBER EXHAUST FROM GAS DELIVERY PANELS 有权
    从气体输送面板减少排气的系统和方法

    公开(公告)号：US20120318362A1

    公开(公告)日：2012-12-20

    申请号：US13220890

    申请日：2011-08-30

    申请人： Mark Taskar ,  Iqbal Shareef

    发明人： Mark Taskar ,  Iqbal Shareef

    IPC分类号： F15D1/00

    CPC分类号： F17D1/00 ,  B08B15/002 ,  B08B15/04 ,  F17C1/00 ,  F17C2221/031 ,  G01M3/22 ,  Y10T137/0318 ,  Y10T137/6851 ,  Y10T137/7736 ,  Y10T137/7761 ,  Y10T137/86107

    摘要： A method and apparatus is provided for decreasing the scrubber exhaust from gas panels, lower the cost of operation, lower the facilitation cost and power consumption by increasing the air velocity in areas of high potential risk of ignition. The apparatus includes a supply of compressed dry air (CDA) through the tubing with individual dispersion nozzles. The CDA dispersion nozzles can be installed at various key locations in order to provide additional ventilation turbulence and reduce potential dead zones inside the gas panel. Aspects of the invention help to save the energy and protect the environment by reducing the power consumption. In addition human safety shall be improved by minimizing the potential risk of ignition.

    摘要翻译： 提供一种方法和装置，用于减少来自气体面板的洗涤器排气，降低操作成本，通过在高潜在的点火风险区域中增加空气速度来降低便利成本和功率消耗。 该设备包括通过具有各个分散喷嘴的管道供应压缩干燥空气（CDA）。 CDA分散喷嘴可以安装在各种关键位置，以便提供额外的通风湍流并减少气体面板内的潜在死区。 本发明的方面有助于通过降低功耗来节省能源和保护环境。 另外，通过最小化潜在的点火风险，可以改善人身安全。

    GAS TRANSPORT DELAY RESOLUTION FOR SHORT ETCH RECIPES
    9.
    发明申请
    GAS TRANSPORT DELAY RESOLUTION FOR SHORT ETCH RECIPES 有权
    气体运输延迟解决方案

    公开(公告)号：US20110005601A1

    公开(公告)日：2011-01-13

    申请号：US12810756

    申请日：2008-12-17

    申请人： Iqbal Shareef ,  Mark Taskar ,  Tony Zemlock

    发明人： Iqbal Shareef ,  Mark Taskar ,  Tony Zemlock

    IPC分类号： F15D1/00

    CPC分类号： H01L21/67069 ,  H01L21/67253 ,  Y10T137/0318 ,  Y10T137/877 ,  Y10T137/87885

    摘要： In one embodiment, an apparatus for providing a gas mixture of a plurality of gases, may have a plurality of mass flow controllers (MFCs), a mixing manifold in fluid connection with each plurality of MFCs, a plurality of mixing manifold exits positioned on the mixing manifold; and an isolation device in fluid connection with each of the plurality of mixing manifold exits.

    摘要翻译： 在一个实施例中，用于提供多种气体的气体混合物的设备可以具有多个质量流量控制器（MFC），与每个多个MFC流体连接的混合歧管，多个混合歧管出口位于 混合歧管 以及与多个混合歧管出口中的每一个流体连接的隔离装置。

    Alternate gas delivery and evacuation system for plasma processing apparatuses
    10.
    发明申请
    Alternate gas delivery and evacuation system for plasma processing apparatuses 有权
    用于等离子体处理装置的替代气体输送和抽空系统

    公开(公告)号：US20090061640A1

    公开(公告)日：2009-03-05

    申请号：US12230089

    申请日：2008-08-22

    申请人： Harry P. Wong ,  Vernon Wong ,  Christopher Charles Griffin ,  Mark Taskar

    发明人： Harry P. Wong ,  Vernon Wong ,  Christopher Charles Griffin ,  Mark Taskar

    IPC分类号： H01L21/3065 ,  C23F1/08

    CPC分类号： C23C16/45523 ,  C23C16/4412 ,  C23C16/45561 ,  C23C16/5096 ,  H01J37/3244 ,  H01J37/32449

    摘要： A gas distribution system for supplying a gas mixture to a plasma process chamber is provided. A first valve arrangement is connected to upstream ends of a first gas line and a second gas line. A second valve arrangement is connected to downstream ends of the first gas line and the second gas line. A first gas distribution outlet line is connected between a gas supply and the first valve arrangement and a first chamber inlet line connected between the second valve arrangement and the plasma process chamber. A first evacuation line is connected to the first gas line at a location between the first valve arrangement and the second valve arrangement. A second evacuation line is connected to the second gas line at a location between the first valve arrangement and the second valve arrangement. The first evacuation line and second evacuation line are in fluid communication with a vacuum line. A controller is operable to actuate the first valve arrangement and second valve arrangement to selectively flow the gas mixture from the gas supply to the plasma process chamber through the first gas line while the second gas is selectively evacuated by the vacuum line; or to selectively flow the gas mixture from the gas supply to the plasma process chamber through the second gas line while the first gas line is selectively evacuated by the vacuum line.

    摘要翻译： 提供了一种用于将气体混合物供应到等离子体处理室的气体分配系统。 第一阀装置连接到第一气体管线和第二气体管线的上游端。 第二阀装置连接到第一气体管线和第二气体管线的下游端。 第一气体分配出口管线连接在气体供应源和第一阀装置之间，连接在第二阀装置和等离子体处理室之间的第一室入口管线。 在第一阀装置和第二阀装置之间的位置处，第一排气管线连接到第一气体管线。 在第一阀装置和第二阀装置之间的位置处，第二排气管线连接到第二气体管线。 第一排气管线和第二排气管线与真空管线流体连通。 控制器可操作以致动第一阀装置和第二阀装置，以选择性地将气体混合物从气体供应通过第一气体管道流动到等离子体处理室，同时第二气体被真空管线选择性地抽真空; 或者通过第二气体管线将气体混合物从气体供给选择性地流动到等离子体处理室，同时第一气体管线被真空管线选择性抽真空。