Invention Grant
- Patent Title: ESD protection circuit
- Patent Title (中): ESD保护电路
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Application No.: US13737964Application Date: 2013-01-10
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Publication No.: US08853784B2Publication Date: 2014-10-07
- Inventor: Da-Wei Lai , Handoko Linewih , Ying-Chang Lin
- Applicant: GLOBALFOUNDRIES Singapore Pte. Ltd.
- Applicant Address: SG Singapore
- Assignee: GLOBALFOUNDRIES Singapore Pte. Ltd.
- Current Assignee: GLOBALFOUNDRIES Singapore Pte. Ltd.
- Current Assignee Address: SG Singapore
- Agency: Horizon IP Pte. Ltd.
- Main IPC: H01L23/62
- IPC: H01L23/62 ; H01L29/66 ; H01L29/78

Abstract:
A device having a substrate defined with a device region which includes an ESD protection circuit is disclosed. The ESD protection circuit has first and second transistors. A transistor includes a gate having first and second sides, a first diffusion region in the device region adjacent to the first side of the gate, and a second diffusion region in the device region displaced away from the second side of the gate. The first and second diffusion regions include dopants of a first polarity type. The device includes a first device well which encompasses the device region and second device wells which are disposed within the first device well. A well contact is coupled to the second device wells. The well contact surrounds the gates of the transistors and abuts the first diffusion regions of the transistors.
Public/Granted literature
- US20130187231A1 ESD PROTECTION CIRCUIT Public/Granted day:2013-07-25
Information query
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