Invention Grant
- Patent Title: Gas discharge chamber
- Patent Title (中): 气体放电室
-
Application No.: US13931840Application Date: 2013-06-29
-
Publication No.: US08855167B2Publication Date: 2014-10-07
- Inventor: Shinji Nagai , Fumika Yoshida , Osamu Wakabayashi , Kouji Kakizaki
- Applicant: Gigaphoton Inc.
- Applicant Address: JP Tokyo
- Assignee: Gigaphoton Inc.
- Current Assignee: Gigaphoton Inc.
- Current Assignee Address: JP Tokyo
- Agency: Kratz, Quintos & Hanson, LLP
- Priority: JP2008-098889 20080407
- Main IPC: H01S3/08
- IPC: H01S3/08 ; G02B5/30 ; G02B1/02 ; H01S3/034 ; H01S3/081 ; H01S3/225

Abstract:
A gas discharge chamber that uses a calcium fluoride crystal which reduces a breakage due to mechanical stress (window holder and laser gas pressure), thermal stress from light absorption, and the like, increases the degree of linear polarization of output laser, and suppresses degradation due to strong ultraviolet (ArF, in particular) laser light irradiation. A first window (2) and a second window (3) of the gas discharge chamber have an incident plane and an emitting plane in parallel with a (111) crystal plane of their calcium fluoride crystal. With respect to an arrangement where laser light entering the calcium fluoride crystal passes through a plane including a axis and a axis of each of the first window (2) and the second window (3) as seen from inside the chamber (1), the first window (2) and the second window (3) are arranged in positions rotated in the same direction by the same angle about their axis.
Public/Granted literature
- US20130322483A1 GAS DISCHARGE CHAMBER Public/Granted day:2013-12-05
Information query