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公开(公告)号：US10820400B2
公开(公告)日：2020-10-27
申请号：US16677882
申请日：2019-11-08
Applicant: Gigaphoton Inc.
Inventor： Hiroaki Tomuro , Shinji Nagai , Yoshiyuki Honda
Abstract: An extreme ultraviolet light generation apparatus includes: a chamber in which plasma is generated from a target substance at a condensation position of a laser beam; a condenser mirror configured to condense extreme ultraviolet light generated by the plasma; and a magnetic field generation unit configured to generate a magnetic field that converges a charged particle generated by the plasma toward a wall of the chamber, the condenser mirror includes a substrate, a reflective layer, and a protective layer provided on the reflective layer, the protective layer has layer thickness distribution in which a layer thickness of the protective layer from a reflective layer surface changes, and the layer thickness of the protective layer is maximum at a position on a line (CL) on which a plane passing through a magnetic field axis of the magnetic field generation unit and a central axis (CA) of the condenser mirror intersects the reflective layer surface (62F).
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公开(公告)号：US10764986B2
公开(公告)日：2020-09-01
申请号：US15347716
申请日：2016-11-09
Applicant: GIGAPHOTON INC.
Inventor： Shinji Nagai , Tamotsu Abe , Hitoshi Nagano , Osamu Wakabayashi
IPC: H05G2/00 , G03F7/20 , G21K1/06 , B23K26/352 , G21K5/02 , G21K5/00 , B23K10/00 , G03B27/32 , B23K26/36 , B23K26/12
Abstract: An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction, unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.
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公开(公告)号：US09872372B2
公开(公告)日：2018-01-16
申请号：US15379230
申请日：2016-12-14
Applicant: Gigaphoton Inc.
Inventor： Atsushi Ueda , Shinji Nagai , Yoshifumi Ueno , Tamotsu Abe
Abstract: An extreme ultraviolet light generation device is to generate extreme ultraviolet light by irradiating a target with a pulse laser beam and thereby turning the target into plasma. The device may include a chamber, a magnet configured to form a magnetic field in the chamber, and an ion catcher including a collision unit disposed so that ions guided by the magnetic field collide with the collision unit.
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公开(公告)号：US10268119B2
公开(公告)日：2019-04-23
申请号：US15945672
申请日：2018-04-04
Applicant: GIGAPHOTON INC.
Inventor： Shinji Nagai , Atsushi Ueda , Takashi Saito
Abstract: An extreme ultraviolet light generating device may include a chamber, an EUV light focusing mirror provided therein, including a reflection surface having a concave curved shape and an outer peripheral portion around an outer edge of the reflection surface, and configured to focus EUV light radiated from plasma generated when a target is irradiated with laser light, a gas supplying device including peripheral heads provided on or along the outer peripheral portion; and a discharge device including a discharge path forming a discharge port near the outer peripheral portion, and configured to discharge an ion or a particle from the discharge port. The peripheral heads each may blow out a gas flow from the outer peripheral portion or a vicinity thereof along the reflection surface, and allow gas flows to join on the reflection surface to thereby form a gas flow along the reflection surface toward the discharge port.
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公开(公告)号：US10136510B2
公开(公告)日：2018-11-20
申请号：US15583001
申请日：2017-05-01
Applicant: Gigaphoton Inc.
Inventor： Shinji Nagai , Georg Soumagne , Toshihiro Nishisaka
Abstract: An extreme ultraviolet light generation device may include a chamber in which extreme ultraviolet light is generated from plasma, the plasma generated by irradiation of a target supplied in a plasma generation region inside of the chamber with laser light; a condenser mirror collecting the extreme ultraviolet light and guiding it to outside of the chamber; a first etching gas supply unit blowing an etching gas to a reflective surface of the condenser mirror and the plasma generation region; a magnet forming a magnetic field in the chamber; a port that intersects a central axis of the magnetic field and that takes in suspended substances generated in the chamber; and an ejection path that is in communication with the port and that ejects the suspended substances taken from the port to the outside of the chamber.
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Patent Agency Ranking
公开(公告)号：US08901524B2
公开(公告)日：2014-12-02
申请号：US14024198
申请日：2013-09-11
Applicant: Gigaphoton Inc
Inventor： Takeshi Asayama , Kouji Kakizaki , Akira Endo , Shinji Nagai
Abstract: An extreme ultraviolet light source apparatus generating an extreme ultraviolet light from plasma generated by irradiating a target material with a laser light within a chamber, and controlling a flow of ions generated together with the extreme ultraviolet light using a magnetic field or an electric field, the extreme ultraviolet light source apparatus comprises an ion collector device collecting the ion via an aperture arranged at a side of the chamber, and an interrupting mechanism interrupting movement of a sputtered particle in a direction toward the aperture, the sputtered particle generated at an ion collision surface collided with the ion in the ion collector device.
Abstract translation: 一种极紫外光源装置，通过在室内产生通过用激光照射目标材料而产生的等离子体的极紫外光，并且利用磁场或电场来控制与极紫外光一起产生的离子的流动， 极紫外光源装置包括离子收集器装置，该离子收集器装置通过布置在腔室一侧的孔收集离子，以及中断机构阻止溅射颗粒朝向孔的方向移动，溅射粒子在离子碰撞面 与离子收集器装置中的离子相撞。
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7.发明授权公开(公告)号：US11272608B2
公开(公告)日：2022-03-08
申请号：US17226515
申请日：2021-04-09
Applicant: Gigaphoton Inc.
Inventor： Atsushi Ueda , Shinji Nagai
Abstract: An extreme ultraviolet light generation apparatus may include a chamber causing a target substance to be turned into plasma with laser light, a light concentrating mirror concentrating extreme ultraviolet light generated by the turning of the target substance into plasma, a gas supply unit supplying gas into the chamber, a magnetic field generation unit generating a magnetic field including a magnetic field axis that crosses a light path of the extreme ultraviolet light, a first exhaust port arranged at a position through which the magnetic field axis passes in the chamber, a second exhaust port arranged at a position opposite to the light concentrating mirror in the chamber, and a gas exhaust amount adjustment unit adjusting a ratio between an exhaust amount of first exhaust gas exhausted from the first exhaust port and an exhaust amount of second exhaust gas exhausted from the second exhaust port.
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公开(公告)号：US11042102B2
公开(公告)日：2021-06-22
申请号：US16894652
申请日：2020-06-05
Applicant: Gigaphoton Inc.
Inventor： Shinji Nagai , Takashi Saito
Abstract: An extreme ultraviolet light generation device configured to generate extreme ultraviolet light by irradiating a target containing tin with a pulse laser beam includes a chamber container, a hydrogen gas supply unit configured to supply hydrogen gas into the chamber container, a heat shield disposed between the chamber container and a predetermined region in which the target is irradiated with the pulse laser beam inside the chamber container, a first cooling medium flow path disposed in the chamber container, a second cooling medium flow path disposed in the heat shield, and a cooling device configured to supply a first cooling medium to the first cooling medium flow path and supply a second cooling medium to the second cooling medium flow path so that a temperature of the heat shield becomes lower than a temperature of the chamber container.
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公开(公告)号：US10001706B2
公开(公告)日：2018-06-19
申请号：US15651259
申请日：2017-07-17
Applicant: GIGAPHOTON INC.
Inventor： Atsushi Ueda , Shinji Nagai
CPC classification number: G03F7/2008 , H05G2/006 , H05G2/008
Abstract: An extreme ultraviolet light generation apparatus may include a chamber, a target supply device configured to successively supply targets into the chamber, and an extreme ultraviolet light collector mirror including a reflective surface having a through-hole at the center thereof. The reflective surface may reflect and collect extreme ultraviolet light generated at a predetermined emission cycle because of irradiation of the successively supplied targets with a laser beam. A gas ejection device may be disposed in the through-hole to jut out from the reflective surface and have a gas ejection opening to eject etching gas for debris onto the reflective surface. The gas ejection device may be configured so that the etching gas takes a longer time than the predetermined emission cycle to reach the through-hole-side end of effective reflective area of the reflective surface after being ejected from the gas ejection opening.
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公开(公告)号：US09465307B2
公开(公告)日：2016-10-11
申请号：US13907818
申请日：2013-05-31
Applicant: GIGAPHOTON INC.
Inventor： Hakaru Mizoguchi , Shinji Nagai
IPC: G03F7/20
CPC classification number: G03F7/70925
Abstract: A cleaning method for an EUV light generation apparatus may include closing a connection portion so that a chamber interior and the interior of an exposure apparatus do not communicate when EUV light is not being generated, supplying an etchant gas for etching debris that has accumulated on a reflective surface of an optical element to the chamber interior in a state where the connection portion is closed, and exhausting the chamber interior using an exhaust apparatus while supplying the etchant gas.
Abstract translation: EUV发光装置的清洁方法可以包括：关闭连接部分，使得当不产生EUV光时，室内部和曝光装置的内部不通信，提供用于蚀刻积聚在 在连接部分关闭的状态下将光学元件的反射表面连接到室内部，并且在供应蚀刻剂气体的同时使用排气装置排出室内部。
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