Invention Grant
- Patent Title: Piezoelectric device, method of manufacturing piezoelectric device, and liquid ejection head
- Patent Title (中): 压电器件，制造压电器件的方法和液体喷射头
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Application No.: US13644239Application Date: 2012-10-03
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Publication No.: US08864288B2Publication Date: 2014-10-21
- Inventor: Takamichi Fujii , Yoshikazu Hishinuma
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP.
- Main IPC: B41J2/045
- IPC: B41J2/045 ; B41J2/14 ; H01L41/257 ; H01L41/29 ; H01L41/047 ; H01L41/316 ; H01L41/053 ; H01L41/09 ; H01L41/297
Abstract:
A piezoelectric device includes: a substrate; a first electrode which is layered over the substrate; a first piezoelectric film which is layered over the first electrode; a metal oxide film which is layered over the first piezoelectric film; a metal film which is layered over the metal oxide film; a second piezoelectric film which is layered over the metal film; and a second electrode which is layered over the second piezoelectric film, wherein a polarizing direction of the first piezoelectric film and a polarizing direction of the second piezoelectric film are different from each other.
Public/Granted literature
- US20130229465A1 PIEZOELECTRIC DEVICE, METHOD OF MANUFACTURING PIEZOELECTRIC DEVICE, AND LIQUID EJECTION HEAD Public/Granted day:2013-09-05
Information query
IPC分类:
