发明授权
- 专利标题: Memory device and method for manufacturing same
- 专利标题(中): 存储器件及其制造方法
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申请号: US13051264申请日: 2011-03-18
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公开(公告)号: US08866119B2公开(公告)日: 2014-10-21
- 发明人: Kazuhiko Yamamoto , Kenji Aoyama
- 申请人: Kazuhiko Yamamoto , Kenji Aoyama
- 申请人地址: JP Tokyo
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2010-235173 20101020
- 主分类号: H01L29/04
- IPC分类号: H01L29/04 ; H01L47/00 ; H01L29/06 ; H01L27/24 ; H01L45/00 ; G11C13/00 ; G11C13/02
摘要:
According to one embodiment, a memory device includes a selection element layer, a nanomaterial aggregate layer, and a fine particle. The nanomaterial aggregate layer is stacked on the selection element layer. The nanomaterial aggregate layer has a plurality of micro conductive bodies aggregated with an interposed gap. The fine particle has at least a surface made of silicon oxynitride. The fine particle is dispersed between the micro conductive bodies in one portion of the nanomaterial aggregate layer piercing the nanomaterial aggregate layer in a thickness direction.
公开/授权文献
- US20120097914A1 MEMORY DEVICE AND METHOD FOR MANUFACTURING SAME 公开/授权日:2012-04-26