发明授权
US08888982B2 Reduction of copper or trace metal contaminants in plasma electrolytic oxidation coatings
有权
减少等离子体电解氧化涂层中的铜或痕量金属污染物
- 专利标题: Reduction of copper or trace metal contaminants in plasma electrolytic oxidation coatings
- 专利标题(中): 减少等离子体电解氧化涂层中的铜或痕量金属污染物
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申请号: US12794470申请日: 2010-06-04
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公开(公告)号: US08888982B2公开(公告)日: 2014-11-18
- 发明人: Xing Chen , Chengxiang Ji , Chiu-Ying Tai
- 申请人: Xing Chen , Chengxiang Ji , Chiu-Ying Tai
- 申请人地址: US MA Andover
- 专利权人: MKS Instruments Inc.
- 当前专利权人: MKS Instruments Inc.
- 当前专利权人地址: US MA Andover
- 代理机构: Proskauer Rose LLP
- 主分类号: C23C28/00
- IPC分类号: C23C28/00 ; C25D11/04 ; C25D11/16 ; C25D11/02 ; H01J37/32 ; H01J37/16 ; C25D5/48
摘要:
A method for creating an oxide layer having a reduced copper concentration over a surface of an object comprising aluminum and copper for use in a semiconductor processing system. The oxide layer produced using a plasma electrolytic oxidation process has a reduced copper peak concentration, which decreases a risk of copper contamination, and includes magnesium oxides that can be converted to magnesium halide upon exposure to an excited halogen-comprising gas or halogen-comprising plasma to increase the erosion/corrosion resistance of the oxide layer.