Invention Grant
- Patent Title: Method and apparatus of forming a conductive layer
- Patent Title (中): 形成导电层的方法和装置
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Application No.: US13656485Application Date: 2012-10-19
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Publication No.: US08895351B2Publication Date: 2014-11-25
- Inventor: Kurtis Leschkies , Steven Verhaverbeke , Robert Visser
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson & Sheridan, LLP
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L31/0392 ; H01L31/0224

Abstract:
The present invention generally includes an apparatus and process of forming a conductive layer on a surface of a host substrate, which can be directly used to form a portion of an electronic device. More specifically, one or more of the embodiments disclosed herein include a process of forming a conductive layer on a surface of a substrate using an electrospinning type deposition process. Embodiments of the conductive layer forming process described herein can be used to reduce the number of processing steps required to form the conductive layer, improve the electrical properties of the formed conductive layer and reduce the conductive layer formation process complexity over current state-of-the-art conductive layer formation techniques. Typical electronic device formation processes that can benefit from one or more of the embodiments described herein include, but are not limited to processes used to form solar cells, electronic visual display devices and touchscreen type technologies.
Public/Granted literature
- US20130102110A1 METHOD AND APPARATUS OF FORMING A CONDUCTIVE LAYER Public/Granted day:2013-04-25
Information query
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