Invention Grant
- Patent Title: Method for manufacturing an electromagnetic radiation detector and detector obtained by a growth substrate removal method
- Patent Title (中): 通过生长衬底去除方法制造电磁辐射探测器和检测器的方法
-
Application No.: US13529256Application Date: 2012-06-21
-
Publication No.: US08900907B2Publication Date: 2014-12-02
- Inventor: Christophe Pautet , Arnaud Etcheberry , Alexandre Causier , Isabelle Gerard
- Applicant: Christophe Pautet , Arnaud Etcheberry , Alexandre Causier , Isabelle Gerard
- Applicant Address: FR Chatenay Malabry FR Paris
- Assignee: Societe Francaise de Detecteurs Infrarouges-Sofradir,Centre National de la Recherche Scientifique
- Current Assignee: Societe Francaise de Detecteurs Infrarouges-Sofradir,Centre National de la Recherche Scientifique
- Current Assignee Address: FR Chatenay Malabry FR Paris
- Agency: Burr & Brown, PLLC
- Priority: FR1102031 20110630
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L27/146 ; H01L31/18 ; H01L31/0296

Abstract:
A method for removing the growth substrate of a circuit of electromagnetic radiation detection, especially in the infrared or visible range, said detection circuit including a layer of detection of said radiation made of Hg(1-x)CdxTe obtained by liquid or vapor phase epitaxy or by molecular beam epitaxy, said detection circuit being hybridized on a read circuit. The method includes submitting the growth substrate to a mechanical or chem.-mech. polishing step or to a chemical etch step to decrease its thickness, all the way to an interface area between the material of the detection circuit and the growth substrate; and submitting the interface thus obtained to an iodine treatment.
Public/Granted literature
- US20130005068A1 METHOD FOR MANUFACTURING AN ELECTROMAGNETIC RADIATION DETECTOR AND DETECTOR OBTAINED BY SUCH A METHOD Public/Granted day:2013-01-03
Information query
IPC分类: