发明授权
- 专利标题: Polypropylene resin composition for use in formation of microporous membrane
- 专利标题(中): 用于形成微孔膜的聚丙烯树脂组合物
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申请号: US13143336申请日: 2010-01-06
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公开(公告)号: US08901240B2公开(公告)日: 2014-12-02
- 发明人: Satoshi Tamura , Keita Itakura , Ryoichi Tsunori , Satoshi Hashizume
- 申请人: Satoshi Tamura , Keita Itakura , Ryoichi Tsunori , Satoshi Hashizume
- 申请人地址: JP Tokyo JP Tokyo
- 专利权人: Mitsui Chemicals Inc.,Prime Polymer Co., Ltd.
- 当前专利权人: Mitsui Chemicals Inc.,Prime Polymer Co., Ltd.
- 当前专利权人地址: JP Tokyo JP Tokyo
- 代理机构: Foley & Lardner LLP
- 优先权: JP2009-001957 20090107
- 国际申请: PCT/JP2010/050040 WO 20100106
- 国际公布: WO2010/079784 WO 20100715
- 主分类号: H01M2/16
- IPC分类号: H01M2/16 ; C08K3/00 ; C08F4/76 ; C08F110/06 ; B01D63/00 ; H01G9/00 ; C08L23/12 ; H01G9/02 ; C08F4/659 ; C08F4/6592 ; C08L23/04 ; H01M10/0525
摘要:
[Object] To provide a polypropylene resin composition for use in the formation of a microporous membrane having excellent heat resistance and low thermal shrinkage ratio.[Solution] A polypropylene resin composition for use in the formation of a microporous membrane according to the present invention comprises as an essential component a propylene homopolymer (A) that satisfies the following requirements (1) to (4) and (7): (1) the intrinsic viscosity [η] is 1 dl/g or more and less than 7 dl/g; (2) the mesopentad fraction ranges from 94.0% to 99.5%; (3) the integral elution volume during heating to 100° C. is 10% or less; (4) the melting point ranges from 153° C. to 167° C.; and (7) in an elution temperature-elution volume curve, the maximum peak has a peak top temperature in the range of 105° C. to 130° C. and a half-width of 7.0° C. or less.